Fatigue and fracture of a Ni-P amorphous alloy thin film on the micrometer scale

Author(s):  
K. TAKASHIMA ◽  
Y. HIGO
2009 ◽  
Vol 34 (4) ◽  
pp. 627-629
Author(s):  
Tokujiro Yamamoto ◽  
Kouichi Hayashi ◽  
Kosuke Suzuki ◽  
Masahisa Ito ◽  
Hisamichi Kimura ◽  
...  

2005 ◽  
Vol 54 (10) ◽  
pp. 1012-1015 ◽  
Author(s):  
Akira SHIBATA ◽  
Ryuichi TARUMI ◽  
Hirotsugu OGI ◽  
Masahiko HIRAO ◽  
Kazuki TAKASHIMA ◽  
...  

2007 ◽  
Vol 101 (5) ◽  
pp. 053519 ◽  
Author(s):  
Ryuichi Tarumi ◽  
Akira Shibata ◽  
Hirotsugu Ogi ◽  
Masahiko Hirao ◽  
Kazuki Takashima ◽  
...  

2012 ◽  
Vol 30 ◽  
pp. 100-103
Author(s):  
Kana Takenaka ◽  
Noriko Saidoh ◽  
Nobuyuki Nishiyama ◽  
Manabu Ishimaru ◽  
Akihisa Inoue

2007 ◽  
Vol 561-565 ◽  
pp. 1375-1378 ◽  
Author(s):  
Shin Wakayama ◽  
Yoshihisa Kimoto ◽  
Yorinobu Takigawa ◽  
Tokuteru Uesugi ◽  
Kenji Higashi

A 2mm-thick bulk amorphous Ni-W alloy is formed by applying a new electroforming process and its states are investigated by the XRD analyses and the EDS measurement. The homogeneities of the electroformed alloys are evaluated by the linear analyses on the cross sections of the sample. The fluctuation of the millimeter-scale W-concentration of the bulk amorphous alloy obtained in the present work is reduced to almost the same as that of the bulk nanocrystalline alloy reported in the previous work. Compared to the thin-film specimen produced by the conventional electroplating processes, the gradient of W-concentration of the bulk amorphous specimen can be reduced to two-fifth in the micrometer-scale profiles. Therefore new electroforming process can be successfully applied to the fabrication of the bulk amorphous Ni-W alloy.


2001 ◽  
Vol 695 ◽  
Author(s):  
K. Takashima ◽  
R. Tarumi ◽  
Y. Higo

ABSTRACTFracture behavior of micro-sized cantilever beam type specimens prepared from an electroless deposited Ni-P amorphous alloy thin film has been investigated at ambient and elevated temperatures. Cantilever beam type specimens with dimensions of 10 x 12 x 50 μm3 were prepared from an electroless deposited Ni-P amorphous alloy thin film and notches were introduced by focused ion beam machining. Fatigue pre-cracks were introduced ahead of the notches. The introduction of fatigue pre-crack and fracture toughness tests were carried out using a mechanical testing machine for micro-sized specimens. The temperature of the specimen was controlled from room temperature to 473 K using a newly developed heating system. Compared with room temperature, fracture toughness increased approximately 40 % at 373 K but decreased 19 % at 473 K. The increase of fracture toughness at 373 K is considered to be related with the formation of nano-sized crystals and the decrease of fracture toughness at 473 K is considered to be due to the growth of crystals. It is required to consider the fracture behavior obtained in this investigation when designing actual MEMS devices using electroless deposited amorphous films.


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