Quantitative comparison between Auger electron spectroscopy and secondary ion mass spectroscopy depth profiles of a double layer structure of AlAs in GaAs using the mixing-roughness-information depth model

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Layer Structure ◽

Quantitative Comparison ◽

Depth Profiles ◽

Double Layer Structure ◽

Information Depth ◽

Chemistry of Metal and Alloy Adherends by Secondary Ion Mass Spectroscopy, Ion Scattering Spectroscopy, and Auger Electron Spectroscopy

Surface Analysis Techniques for Metallurgical Applications ◽

10.1520/stp39064s ◽

2009 ◽

pp. 86-86-15

Author(s):

WL Baun ◽

NT McDevitt ◽

JS Solomon

Keyword(s):

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ion Scattering ◽

Ion Scattering Spectroscopy ◽

Grain boundary and interdiffusion studies in compound semiconductor thin films and devices utilizing Auger electron spectroscopy and secondary ion mass spectroscopy

Thin Solid Films ◽

10.1016/0040-6090(79)90413-9 ◽

1979 ◽

Vol 57 (1) ◽

pp. 99-106 ◽

Cited By ~ 30

Author(s):

L.L. Kazmerski

Keyword(s):

Thin Films ◽

Grain Boundary ◽

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Compound Semiconductor ◽

Semiconductor Thin Films ◽

The hydroxylation of passive oxide films on X-70 steel by dissolved hydrogen studied by nuclear reaction analysis, Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectroscopy

Thin Solid Films ◽

10.1016/j.tsf.2005.10.083 ◽

2006 ◽

Vol 503 (1-2) ◽

pp. 149-157 ◽

Cited By ~ 7

Author(s):

Chunsi Zhang ◽

Jingli Luo ◽

David Munoz-Paniagua ◽

Peter R. Norton

Keyword(s):

Nuclear Reaction ◽

Mass Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nuclear Reaction Analysis ◽

X Ray ◽

Dissolved Hydrogen ◽

Adhesion enhancement of magnetron-sputtered copper films by ion bombardment etching treatment of nickel and Inconel substrates: investigations by Auger electron spectroscopy and secondary ion mass spectroscopy of the ion beam effects

Journal of Adhesion Science and Technology ◽

10.1163/156856191x00891 ◽

1991 ◽

Vol 5 (11) ◽

pp. 987-999 ◽

Cited By ~ 5

Author(s):

M. Cahoreau ◽

G.H. Lee ◽

J. Caisso ◽

M. Cailler

Keyword(s):

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ion Beam ◽

Ion Bombardment ◽

Copper Films ◽

A preliminary study of pure metal surfaces using Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS) and Secondary Ion Mass Spectroscopy (SIMS)

Surface Science ◽

10.1016/0039-6028(75)90160-0 ◽

1975 ◽

Vol 53 (1) ◽

pp. 636-648 ◽

Cited By ~ 12

Author(s):

M. Gettings ◽

J.P. Coad

Keyword(s):

Mass Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Pure Metal ◽

X Ray ◽

Preliminary Study ◽

X-ray photoelectron spectroscopy, X-ray excited Auger electron spectroscopy and time-of-flight secondary ion mass spectroscopy characterization of carbon fibres activated by d.c. corona discharge at ambient pressure and temperature

Journal of Electron Spectroscopy and Related Phenomena ◽

10.1016/s0368-2048(97)00068-6 ◽

1997 ◽

Vol 85 (3) ◽

pp. 179-191 ◽

Cited By ~ 18

Author(s):

E Desimoni ◽

A.M Salvi ◽

F Langerame ◽

J.F Watts

Keyword(s):

Mass Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ambient Pressure ◽

Carbon Fibres ◽

X Ray ◽

Mass spectroscopy of recoiled ions, secondary ion mass spectroscopy, and Auger electron spectroscopy investigation of Y2O3-stabilized ZrO2(100) and (110)

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581668 ◽

1999 ◽

Vol 17 (3) ◽

pp. 939-944 ◽

Cited By ~ 2

Author(s):

G. S. Herman ◽

M. A. Henderson ◽

K. A. Starkweather ◽

E. P. McDaniel

Keyword(s):

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

The study of hydrogen segregation on Zr(0001) and Zr(1010) surfaces by static secondary ion mass spectroscopy, work function, Auger electron spectroscopy and nuclear reaction analysis

Journal of Alloys and Compounds ◽

10.1016/0925-8388(95)01847-6 ◽

1995 ◽

Vol 231 (1-2) ◽

pp. 354-363 ◽

Cited By ~ 31

Author(s):

C.-S. Zhang ◽

B. Li ◽

P.R. Norton

Keyword(s):

Work Function ◽

Nuclear Reaction ◽

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nuclear Reaction Analysis ◽

Hydrogen Segregation ◽

Determination and application of the depth resolution function in sputter profiling with secondary ion mass spectroscopy and Auger electron spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581239 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1096-1102 ◽

Cited By ~ 27

Author(s):

Siegfried Hofmann ◽

Johannes Schubert

Keyword(s):

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Resolution ◽

Resolution Function ◽

Evidence for the segregation of impurities to grain boundaries in multigrained silicon using Auger electron spectroscopy and secondary ion mass spectroscopy

Applied Physics Letters ◽

10.1063/1.91479 ◽

1980 ◽

Vol 36 (4) ◽

pp. 323-325 ◽

Cited By ~ 44

Author(s):

L. L. Kazmerski ◽

P. J. Ireland ◽

T. F. Ciszek

Keyword(s):

Grain Boundaries ◽

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion ◽

Segregation Of Impurities