Growth of in situ CoSi[sub 2] layer by metalorganic chemical vapor deposition on Si tips and its field-emission properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1354977 ◽

2001 ◽

Vol 19 (2) ◽

pp. 533 ◽

Author(s):

Byung Wook Han ◽

Hwa Sung Rhee ◽

Byung Tae Ahn

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Emission Properties ◽

Field Emission Properties ◽

Metalorganic Chemical

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Growth of InNAs by low-pressure metalorganic chemical vapor deposition employing microwave-cracked nitrogen and in situ generated arsine radicals

Journal of Crystal Growth ◽

10.1016/s0022-0248(00)00975-1 ◽

2001 ◽

Vol 222 (3) ◽

pp. 511-517 ◽

Author(s):

H Naoi ◽

D.M Shaw ◽

Y Naoi ◽

G.J Collins ◽

S Sakai

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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In-situ observation and surface morphology of YBa2Cu3O7-y films by metalorganic chemical vapor deposition

Advances in Superconductivity XI ◽

10.1007/978-4-431-66874-9_255 ◽

1999 ◽

pp. 1089-1092 ◽

Author(s):

Yutaka Yoshida ◽

Morihiro Iwata ◽

Masato Hasegawa ◽

Kenichi Tamura ◽

Koji Ishizawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

In Situ Observation ◽

Metalorganic Chemical

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Field emission properties of carbon nitride synthesized by microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.12.030 ◽

2019 ◽

Vol 671 ◽

pp. 53-58

Author(s):

Ippei Tanaka ◽

Koudai Yarita ◽

Yukihiro Sakamoto

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Emission Properties ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Electron field emission properties of nanodiamonds synthesized by the chemical vapor deposition process

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1349207 ◽

2001 ◽

Vol 19 (3) ◽

pp. 975 ◽

Author(s):

Yu-Che Yu ◽

Jin-Hua Huang ◽

I-Nan Lin

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Electron Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Electron Field ◽

Electron Field Emission Properties

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Controlling growth and field emission properties of silicon nanotube arrays by multistep template replication and chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2042545 ◽

2005 ◽

Vol 87 (11) ◽

pp. 113104 ◽

Author(s):

Cheng Mu ◽

Yuxiang Yu ◽

Wei Liao ◽

Xinsheng Zhao ◽

Dongsheng Xu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanotube Arrays ◽

Emission Properties ◽

Field Emission Properties ◽

Silicon Nanotube

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High-resistive layers obtained through periodic growth and in situ annealing of InGaN by metalorganic chemical vapor deposition

AIP Advances ◽

10.1063/1.4953329 ◽

2016 ◽

Vol 6 (6) ◽

pp. 065301

Author(s):

Shuo Zhang ◽

Ping Ma ◽

Boting Liu ◽

Dongxue Wu ◽

Yuliang Huang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Periodic Growth ◽

Metalorganic Chemical

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Selective metalorganic chemical vapor deposition growth of GaAs on AlGaAs combined with in situ HCl gas etching

Journal of Crystal Growth ◽

10.1016/0022-0248(93)90006-i ◽

1993 ◽

Vol 134 (1-2) ◽

pp. 35-42 ◽

Author(s):

Hirotaka Kizuki ◽

Norio Hayafuji ◽

Nariaki Fujii ◽

Nobuaki Kaneno ◽

Yutaka Mihashi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Hcl Gas ◽

Metalorganic Chemical

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Field-Emission Properties of Nanostructured WO3Arrays Fabricated Using Tungsten Hot-Filament Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.090206 ◽

2009 ◽

Vol 48 (9) ◽

pp. 090206 ◽

Author(s):

Di Lu ◽

Akihisa Ogino ◽

Bo Liang ◽

Jiabin Liu ◽

Masaaki Nagatsu

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Properties ◽

Field Emission Properties ◽

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Chemical vapor deposition growth of InN nanostructures: Morphology regulation and field emission properties

Applied Surface Science ◽

10.1016/j.apsusc.2012.06.013 ◽

2012 ◽

Vol 258 (24) ◽

pp. 9701-9705 ◽

Author(s):

Fan Zhang ◽

Qiang Wu ◽

Yongliang Zhang ◽

Jianmin Zhu ◽

Ning Liu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Emission Properties ◽

Field Emission Properties

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Effect of whisker diameter on field emission properties of silicon carbide whiskers grown by chemical vapor deposition

Journal of Materials Science ◽

10.1007/s10853-005-2388-7 ◽

2005 ◽

Vol 40 (11) ◽

pp. 3025-3026 ◽

Author(s):

Dong Chan Lim ◽

Byoung In Joo ◽

Jin Hyung Jun ◽

Doo Jin Choi

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Properties ◽

Field Emission Properties ◽

Silicon Carbide Whiskers ◽

Whisker Diameter

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