Method to enhance atomic-layer deposition of tungsten–nitride diffusion barrier for Cu interconnect
2003 ◽
Vol 21
(4)
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pp. 1411
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2006 ◽
Vol 24
(4)
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pp. 1956
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Keyword(s):
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2003 ◽
Vol 42
(Part 1, No. 10)
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pp. 6359-6362
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2019 ◽
Vol 45
(6)
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pp. 7407-7412
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2019 ◽
Vol 31
(20)
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pp. 8338-8350
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