Deposition of silicon carbide films using a high vacuum metalorganic chemical vapor deposition method with a single source precursor: Study of their structural properties

2004 ◽  
Vol 22 (4) ◽  
pp. 2216 ◽  
Author(s):  
S. H. Jeong ◽  
D. C. Lim ◽  
H.-G. Jee ◽  
O. M. Moon ◽  
C.-K. Jung ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
High Vacuum ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Single Source ◽  
Deposition Method ◽  
Single Source Precursor ◽  
Metalorganic Chemical
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