Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching

2007 ◽  
Vol 25 (6) ◽  
pp. 1963 ◽  
Author(s):  
Chi-Chun Liu ◽  
Paul F. Nealey ◽  
Yuk-Hong Ting ◽  
Amy E. Wendt
Keyword(s):  
Methyl Methacrylate ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Ion Etching ◽  
Copolymer Films ◽  
Methacrylate Copolymer

Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching

1999 ◽  
Vol 17 (1) ◽  
pp. 113 ◽  
Author(s):  
Christopher J. M. Smith ◽  
Saad K. Murad ◽  
Thomas F. Krauss ◽  
Richard M. De La Rue ◽  
Christopher D. W. Wilkinson
Keyword(s):  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Transfer Layer ◽  
Ion Etching ◽  
Initial Pattern

scholarly journals Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

2017 ◽  
Vol 28 (40) ◽  
pp. 404001 ◽  
Author(s):  
M Dialameh ◽  
F Ferrarese Lupi ◽  
D Imbraguglio ◽  
F Zanenga ◽  
A Lamperti ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Feature Size ◽  
Ion Etching ◽  
Etching Pattern

Ion and electron beam deposited masks for pattern transfer by reactive ion etching

2011 ◽  
Vol 88 (8) ◽  
pp. 2710-2713 ◽  
Author(s):  
A. Notargiacomo ◽  
E. Giovine ◽  
L. Di Gaspare
Keyword(s):  
Electron Beam ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Ion Etching
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