Etching of TiN-based gates for advanced complementary metal-oxide-semiconductor devices
2008 ◽
Vol 26
(4)
◽
pp. 1440
◽
2009 ◽
Vol 27
(3)
◽
pp. 1261
2011 ◽
Vol 32
(7)
◽
pp. 076001
◽
2000 ◽
Vol 39
(Part 1, No. 12B)
◽
pp. 6843-6848
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2009 ◽
Vol 48
(4)
◽
pp. 04C087
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