Two-step resist-development process of hydrogen silsesquioxane for high-density electron-beam nanopatterning

2009 ◽  
Vol 27 (1) ◽  
pp. 188 ◽  
Author(s):  
Hyo-Sung Lee ◽  
Jung-Sub Wi ◽  
Sung-Wook Nam ◽  
Hyun-Mi Kim ◽  
Ki-Bum Kim
Keyword(s):  
Electron Beam ◽  
Development Process ◽  
High Density ◽  
Hydrogen Silsesquioxane

Generation of high capacity, high density bubble domain patterns using electron beam technology

1979 ◽  
Vol 50 (B3) ◽  
pp. 2274-2276
Author(s):  
J. P. Reekstin ◽  
J.C. Potosky ◽  
R. G. Imerson
Keyword(s):  
Electron Beam ◽  
High Capacity ◽  
High Density

Electron beam lithography for high density meta fish scale operational at optical frequency

2009 ◽  
Vol 86 (4-6) ◽  
pp. 1081-1084 ◽  
Author(s):  
Yifang Chen ◽  
Alexander S. Schwanecke ◽  
V.A. Fedotov ◽  
V.V. Khardikov ◽  
P.L. Mladyonov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Density ◽  
Optical Frequency ◽  
Fish Scale
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