Enhancing the electron beam sensitivity of hydrogen silsesquioxane (HSQ)

Mapping Intimacies ◽

10.1117/12.536245 ◽

2004 ◽

Author(s):

Augustin Jeyakumar ◽

Clifford L. Henderson

Keyword(s):

Electron Beam ◽

Hydrogen Silsesquioxane

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Optimization of electron beam patterned hydrogen silsesquioxane mask edge roughness for low-loss silicon waveguides

Journal of Nanophotonics ◽

10.1117/1.jnp.8.083098 ◽

2014 ◽

Vol 8 (1) ◽

pp. 083098 ◽

Author(s):

Michael G. Wood ◽

Li Chen ◽

Justin R. Burr ◽

Ronald M. Reano

Keyword(s):

Electron Beam ◽

Hydrogen Silsesquioxane ◽

Low Loss ◽

Silicon Waveguides ◽

Edge Roughness ◽

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Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2987965 ◽

2008 ◽

Vol 26 (6) ◽

pp. 2049-2053 ◽

Author(s):

Vadim Sidorkin ◽

Emile van der Drift ◽

Huub Salemink

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Hydrogen Silsesquioxane ◽

Ultrahigh Resolution ◽

Exposure Temperature ◽

Resolution Electron

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Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2794316 ◽

2007 ◽

Vol 25 (6) ◽

pp. 1998 ◽

Author(s):

Anda E. Grigorescu ◽

Marco C. van der Krogt ◽

Cees W. Hagen ◽

Pieter Kruit

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Development Process ◽

Hydrogen Silsesquioxane ◽

Resolution Electron

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Two-step resist-development process of hydrogen silsesquioxane for high-density electron-beam nanopatterning

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3049482 ◽

2009 ◽

Vol 27 (1) ◽

pp. 188 ◽

Author(s):

Hyo-Sung Lee ◽

Jung-Sub Wi ◽

Sung-Wook Nam ◽

Hyun-Mi Kim ◽

Ki-Bum Kim

Keyword(s):

Electron Beam ◽

Development Process ◽

High Density ◽

Hydrogen Silsesquioxane

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A Novel and Low Thermal Budget Planarization Scheme for Pre-Metal Dielectric Using Electron-Beam Cured HSQ (Hydrogen Silsesquioxane) in STC (Stacked Capacitor) DRAM

10.7567/ssdm.1999.b-13-1 ◽

1999 ◽

Author(s):

Hae-Jeong Lee ◽

Seong-Ho Kim ◽

Juseon Goo ◽

Byeong Jun Kim ◽

Ho-Kyu Kang ◽

...

Keyword(s):

Electron Beam ◽

Hydrogen Silsesquioxane ◽

Thermal Budget ◽

Low Thermal Budget

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Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1603284 ◽

2003 ◽

Vol 21 (5) ◽

pp. 2018 ◽

Author(s):

W. Henschel ◽

Y. M. Georgiev ◽

H. Kurz

Keyword(s):

Electron Beam ◽

High Contrast ◽

Hydrogen Silsesquioxane ◽

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Electron-beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in situ electron-beam-induced desorption

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3425632 ◽

2010 ◽

Vol 28 (3) ◽

pp. 581-587 ◽

Author(s):

D. L. Olynick ◽

B. Cord ◽

A. Schipotinin ◽

D. F. Ogletree ◽

P. J. Schuck

Keyword(s):

Electron Beam ◽

Vibrational Spectroscopy ◽

Hydrogen Silsesquioxane

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Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask patterned by electron beam lithography

Microelectronic Engineering ◽

10.1016/j.mee.2010.11.045 ◽

2011 ◽

Vol 88 (8) ◽

pp. 2338-2341 ◽

Author(s):

M.A. Mohammad ◽

S.K. Dew ◽

S. Evoy ◽

M. Stepanova

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Carbon Nitride ◽

Hydrogen Silsesquioxane ◽

Silicon Carbon ◽

Silicon Carbon Nitride

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3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3629811 ◽

2011 ◽

Vol 29 (6) ◽

pp. 06F301 ◽

Author(s):

Joan Vila-Comamala ◽

Sergey Gorelick ◽

Vitaliy A. Guzenko ◽

Christian David

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Hydrogen Silsesquioxane

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Hydrogen silsesquioxane electron beam lithography for ultra-small single electron transistors in silicon on insulator

Microelectronic Engineering ◽

10.1016/j.mee.2009.10.022 ◽

2010 ◽

Vol 87 (5-8) ◽

pp. 1643-1645 ◽

Author(s):

W. Daves ◽

M. Ruoff ◽

M. Fleischer ◽

D.A. Wharam ◽

D.P. Kern

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Silicon On Insulator ◽

Single Electron ◽

Hydrogen Silsesquioxane ◽

Single Electron Transistors ◽

Electron Transistors

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