Role of the reactive sputtering deposition power in the phase control of cobalt oxide films

2018 ◽  
Vol 36 (6) ◽  
pp. 061512 ◽  
Author(s):  
Nilton Francelosi Azevedo Neto ◽  
Douglas M. G. Leite ◽  
Paulo N. Lisboa-Filho ◽  
José H. D. da Silva
2022 ◽  
Vol 40 (1) ◽  
pp. 013405
Author(s):  
Nilton Francelosi A. Neto ◽  
Cristiane Stegemann ◽  
Lucas J. Affonço ◽  
Douglas M. G. Leite ◽  
José H. D. da Silva

Nanoscale ◽  
2019 ◽  
Vol 11 (20) ◽  
pp. 10034-10044 ◽  
Author(s):  
W. Xu ◽  
C. X. Li ◽  
Q. Y. Zhang ◽  
C. Y. Ma ◽  
Q. Wang ◽  
...  

Reactive sputtering deposition of metal oxides onto Ag films for fabrication of hierarchically structured silver oxide films with rich porosity.


1985 ◽  
Vol 60 ◽  
Author(s):  
Toru Yamashita ◽  
J. W. Robinson ◽  
H. Yamauchi

AbstractTiOx thin films were fabricated by means of a reactive sputtering technique in an rf triode sputtering-deposition unit. The deposition rate was studied in detail. A ‘phase diagram’ of TiOx was determined. XPS study showed the formation of a Ti02 surface layer on TiOx thin films. Oxygen was removed by the Ar+ bombardment on Ti02 to yield Ti203.


Langmuir ◽  
2016 ◽  
Vol 32 (16) ◽  
pp. 4077-4085 ◽  
Author(s):  
Siyang Wang ◽  
Pattarasai Tangvijitsakul ◽  
Zhe Qiang ◽  
Sarang M. Bhaway ◽  
Kehua Lin ◽  
...  

2007 ◽  
Vol 46 (9B) ◽  
pp. 6315-6318 ◽  
Author(s):  
Katsuyoshi Takano ◽  
Aichi Inouye ◽  
Shunya Yamamoto ◽  
Masaki Sugimoto ◽  
Masahito Yoshikawa ◽  
...  

2012 ◽  
Vol 85 (11) ◽  
Author(s):  
Matthias Gubo ◽  
Lutz Hammer ◽  
Klaus Heinz
Keyword(s):  

1990 ◽  
Vol 35 (6) ◽  
pp. 975-984 ◽  
Author(s):  
Lynn C. Schumacher ◽  
Ingo B. Holzhueter ◽  
Ian R. Hill ◽  
Michael J. Dignam

2017 ◽  
Vol 29 (3) ◽  
pp. 950-957 ◽  
Author(s):  
Jared S. Mondschein ◽  
Juan F. Callejas ◽  
Carlos G. Read ◽  
Jamie Y. C. Chen ◽  
Cameron F. Holder ◽  
...  

2003 ◽  
Vol 150 (7) ◽  
pp. E337 ◽  
Author(s):  
Nicolae Spataru ◽  
Chiaki Terashima ◽  
Kenichi Tokuhiro ◽  
Irwan Sutanto ◽  
Donald A. Tryk ◽  
...  

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