scholarly journals Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment

Author(s):  
Chen Li ◽  
Thorsten Hofmann ◽  
Klaus Edinger ◽  
Valery Godyak ◽  
Gottlieb S. Oehrlein
2011 ◽  
Author(s):  
A. Danehkar ◽  
N. S. Saini ◽  
M. A. Hellberg ◽  
I. Kourakis ◽  
Vladimir Yu. Nosenko ◽  
...  

2018 ◽  
Vol 25 (10) ◽  
pp. 102104 ◽  
Author(s):  
Xiao-Juan Wang ◽  
Zhang-Hu Hu ◽  
Yong-Tao Zhao ◽  
You-Nian Wang

1991 ◽  
Vol 60 (1) ◽  
pp. 344B-344B ◽  
Author(s):  
Tetsu Yajima ◽  
Miki Wadati

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