Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment
2020 ◽
Vol 38
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pp. 032208
Chen Li
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Thorsten Hofmann
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Klaus Edinger
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Valery Godyak
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Gottlieb S. Oehrlein
2007 ◽
Vol 50
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pp. 521-527
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A. C. Klimov
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V. A. Burdovitsyn
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E. M. Oks
1992 ◽
Vol 67
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Keiichiro Yamagiwa
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Masayoshi Tanaka
1975 ◽
Vol 94
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pp. 209-242
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Ronald C Davidson
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Bertram H Hui
A. Danehkar
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N. S. Saini
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M. A. Hellberg
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I. Kourakis
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Vladimir Yu. Nosenko
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...
2006 ◽
Vol 40
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pp. 421-425
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M. N. Vasil’ev
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T. M. Vasil’eva
2020 ◽
Vol 12
(1)
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pp. 5-11
Kyaw Oo Aung
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Hlaing Htun Ye
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M.N. Vasiliev
2018 ◽
Vol 25
(10)
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pp. 102104
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Xiao-Juan Wang
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Zhang-Hu Hu
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Yong-Tao Zhao
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You-Nian Wang
1996 ◽
Vol 65
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pp. 2081-2086
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Masayuki Yoshikawa
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Masaru Masuzaki
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Ritoku Ando
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Keiichi Kamada
2012 ◽
Vol 21
(1)
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pp. 52-59
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1991 ◽
Vol 60
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pp. 344B-344B
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Tetsu Yajima
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Miki Wadati