Sharing of Auger electron spectroscopy and x‐ray photoeletron spectroscopy spectral data with the common data processing system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579211 ◽

1994 ◽

Vol 12 (4) ◽

pp. 2342-2347 ◽

Author(s):

Kazuhiro Yoshihara ◽

Michiko Yoshitake

Keyword(s):

Data Processing ◽

Auger Electron Spectroscopy ◽

Spectral Data ◽

Electron Spectroscopy ◽

Auger Electron ◽

Processing System ◽

Data Processing System ◽

X Ray ◽

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Sharing of Auger electron spectroscopy and x-ray photoelectron spectroscopy spectral data through the Internet

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581156 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1388-1393 ◽

Author(s):

Kazuhiro Yoshihara ◽

Michiko Yoshitake

Keyword(s):

Auger Electron Spectroscopy ◽

Spectral Data ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

The Internet ◽

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results

10.3403/30242215 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Study of amorphous and crystallised Fe75B25 by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science ◽

10.1016/0169-4332(91)90396-2 ◽

1991 ◽

Vol 51 (3-4) ◽

pp. 139-155 ◽

Author(s):

S.K. Sharma ◽

S. Hofmann

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

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Round Robin on Spectrometer Transmission Calibration for AES in the Common Data Processing System

Surface and Interface Analysis ◽

10.1002/(sici)1096-9918(199703)25:3<209::aid-sia228>3.0.co;2-t ◽

1997 ◽

Vol 25 (3) ◽

pp. 209-216 ◽

Author(s):

M. Yoshitake ◽

K. Yoshihara

Keyword(s):

Data Processing ◽

Processing System ◽

Round Robin ◽

Data Processing System ◽

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X-ray photoemission and Auger electron spectroscopy analysis of fast responding activated metal oxide silicon carbide gas sensors

Thin Solid Films ◽

10.1016/s0040-6090(96)09407-2 ◽

1997 ◽

Vol 299 (1-2) ◽

pp. 183-189 ◽

Author(s):

A Lloyd Spetz ◽

D Schmeißer ◽

A Baranzahi ◽

B Wälivaara ◽

W Göpel ◽

...

Keyword(s):

Silicon Carbide ◽

Metal Oxide ◽

Auger Electron Spectroscopy ◽

Gas Sensors ◽

Electron Spectroscopy ◽

Auger Electron ◽

Spectroscopy Analysis ◽

Auger Electron Spectroscopy Analysis ◽

X Ray ◽

Metal Oxide Silicon

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International Standardization of Quantitative Surface Analysis by Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

Shinku ◽

10.3131/jvsj.48.261 ◽

2005 ◽

Vol 48 (4) ◽

pp. 261-264

Author(s):

Shigeo TANUMA

Keyword(s):

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Quantitative Surface Analysis ◽

International Standardization

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Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results

Surface and Interface Analysis ◽

10.1002/sia.2533 ◽

2007 ◽

Vol 39 (5) ◽

pp. 464-466 ◽

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574092 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2463-2469 ◽

Author(s):

Brad J. Burrow ◽

Alan E. Morgan ◽

Russell C. Ellwanger

Keyword(s):

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

X Ray ◽

Sputter Deposited

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Initial adsorption kinetics of oxygen on a Cu0.82Li0.18 alloy surface studied by combined Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and time‐of‐flight spectrometry of direct recoils

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574817 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1136-1141 ◽

Author(s):

M. H. Mintz ◽

U. Atzmony ◽

J. A. Schultz ◽

N. Shamir

Keyword(s):

Auger Electron Spectroscopy ◽

Adsorption Kinetics ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Time Of Flight ◽

Alloy Surface ◽

X Ray ◽

Initial Adsorption ◽

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