Limitation of low-temperature low-pressure chemical vapor deposition of SiO2 for the insulation of high-density multilevel metal very large scale integrated circuits

1989 ◽  
Vol 7 (2) ◽  
pp. 229 ◽  
Author(s):  
Paul E. Riley
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Integrated Circuits ◽  
Vapor Deposition ◽  
Large Scale ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Density ◽  
Pressure Chemical

Low‐temperature epitaxial growth of silicon by low‐pressure chemical vapor deposition

1988 ◽  
Vol 52 (13) ◽  
pp. 1053-1055 ◽  
Author(s):  
D. Meakin ◽  
M. Stobbs ◽  
J. Stoemenos ◽  
N. A. Economou
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

Low‐temperature Si/Si1−xGex/Si heterostructure growth at high Ge fractions by low‐pressure chemical vapor deposition

1992 ◽  
Vol 61 (22) ◽  
pp. 2674-2676 ◽  
Author(s):  
Reiner Schütz ◽  
Junichi Murota ◽  
Takahiro Maeda ◽  
Roland Kircher ◽  
Kuniyoshi Yokoo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical

TiNCl formation during low‐temperature, low‐pressure chemical vapor deposition of TiN

1993 ◽  
Vol 62 (19) ◽  
pp. 2326-2328 ◽  
Author(s):  
Rama I. Hegde ◽  
Robert W. Fiordalice ◽  
Philip J. Tobin
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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