Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition

Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Chinese Optics Letters ◽

10.3788/col202018.083101 ◽

2020 ◽

Vol 18 (8) ◽

pp. 083101

Author(s):

Liangyi Hang ◽

Weiguo Liu ◽

Junqi Xu

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Structural And Optical Properties ◽

Amorphous Silicon Nitride

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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Growth Behavior, Nucleation Control and Excellent Optical Properties of Atomically Thin WS2 Thin Films Processed via Gas-phase Chemical Vapor Deposition

Applied Surface Science ◽

10.1016/j.apsusc.2021.150908 ◽

2021 ◽

pp. 150908

Author(s):

Nitin Babu Shinde ◽

Beo Deul Ryu ◽

Chang-Hee Hong ◽

Bellarmine Francis ◽

S. Chandramohan ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Growth Behavior ◽

Phase Chemical

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Microstructure and Optical Properties of Al[sub x]Ga[sub 1−x]N∕GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

10.1063/1.2906048 ◽

2008 ◽

Author(s):

H. Sutanto ◽

A. Subagio ◽

E. Supriyanto ◽

P. Arifin ◽

M. Budiman ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Gan Heterostructure ◽

Metalorganic Chemical

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Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-012-0934-z ◽

2012 ◽

Vol 24 (4) ◽

pp. 1361-1368 ◽

Cited By ~ 16

Author(s):

Fatemeh Shariatmadar Tehrani ◽

Boon Tong Goh ◽

Muhamad Rasat Muhamad ◽

Saadah Abdul Rahman

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Structural And Optical Properties

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Preparation of yttrium iron garnet thin films by mist chemical vapor deposition method and their magneto-optical properties

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.05fb17 ◽

2014 ◽

Vol 53 (5S1) ◽

pp. 05FB17 ◽

Cited By ~ 7

Author(s):

Situ Yao ◽

Takashi Sato ◽

Kentaro Kaneko ◽

Shunsuke Murai ◽

Koji Fujita ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Yttrium Iron Garnet ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Yttrium Iron ◽

Iron Garnet

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Cited By ~ 3

Author(s):

M. Hernández Vélez

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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ArF excimer laser processing of plasma enhanced chemical vapor deposition silicon oxynitride thin films: Changes in deep ultraviolet transparency and composition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584765 ◽

1989 ◽

Vol 7 (3) ◽

pp. 429 ◽

Cited By ~ 1

Author(s):

J. N. Cox

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Laser Processing ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Deep Ultraviolet ◽

Arf Excimer Laser

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Nanostructure and optical properties of CeO2 thin films obtained by plasma-enhanced chemical vapor deposition

Materials Science and Engineering C ◽

10.1016/j.msec.2003.09.103 ◽

2003 ◽

Vol 23 (6-8) ◽

pp. 1013-1016 ◽

Cited By ~ 47

Author(s):

D. Barreca ◽

G. Bruno ◽

A. Gasparotto ◽

M. Losurdo ◽

E. Tondello

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor

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Electronic and Optical Properties of a-Si1−xCx:H Films Produced From Admixtures of Silane and Ditertiarybutylsilane

MRS Proceedings ◽

10.1557/proc-336-553 ◽

1994 ◽

Vol 336 ◽

Cited By ~ 1

Author(s):

K. Gaughan ◽

J.M. Viner ◽

P.C. Taylor

Keyword(s):

Electrical Conductivity ◽

Silicon Carbide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Photothermal Deflection Spectroscopy ◽

Optical And Electronic Properties ◽

Photothermal Deflection

ABSTRACTWe investigated the optical and electronic properties of amorphous silicon carbide (a-Si1−xCx:H) films produced by plasma enhanced chemical vapor deposition from admixtures of silane and ditertiarybutylsilane [SiH2 (C4H9) 2 or DTBS] using photothermal deflection spectroscopy, electrical conductivity and its temperature dependence as well as photoconductivity. These a-Si1−xCx:H films exhibit low Urbach energies and high photoconductivities similar to films produced with other carbon feedstock sources. We also present our results for hydrogen diluted a-Si1−xCx:H films using DTBS as the carbon feedstock source.

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