Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study

2022 ◽  
Vol 40 (1) ◽  
pp. 013201
Author(s):  
Yu-Hao Tsai ◽  
Mingmei Wang
Keyword(s):  
Selective Etching ◽  
First Principle ◽  
Fundamental Study

Fundamental Study on the Selective Etching of Al0.25Ga0.75As Versus GaAs in Acidic Iodine Solutions

1995 ◽  
Vol 142 (10) ◽  
pp. 3589-3595 ◽  
Author(s):  
P. J. Verpoort ◽  
I. E. Vermeir ◽  
W. P. Gomes
Keyword(s):  
Selective Etching ◽  
Fundamental Study

In Situ microscopy of the anodic etching of silicon

1995 ◽  
Vol 53 ◽  
pp. 232-233
Author(s):  
Frances M. Ross ◽  
Peter C. Searson
Keyword(s):  
Composite Structures ◽  
High Surface ◽  
High Surface Area ◽  
Chemical Properties ◽  
Selective Etching ◽  
Silicon On Insulator ◽  
Second Phase ◽  
Porous Layers ◽  
New Class ◽  
Porous Semiconductors

Porous semiconductors represent a relatively new class of materials formed by the selective etching of a single or polycrystalline substrate. Although porous silicon has received considerable attention due to its novel optical properties1, porous layers can be formed in other semiconductors such as GaAs and GaP. These materials are characterised by very high surface area and by electrical, optical and chemical properties that may differ considerably from bulk. The properties depend on the pore morphology, which can be controlled by adjusting the processing conditions and the dopant concentration. A number of novel structures can be fabricated using selective etching. For example, self-supporting membranes can be made by growing pores through a wafer, films with modulated pore structure can be fabricated by varying the applied potential during growth, composite structures can be prepared by depositing a second phase into the pores and silicon-on-insulator structures can be formed by oxidising a buried porous layer. In all these applications the ability to grow nanostructures controllably is critical.

Fundamental Study on Application of the Nanocomposite to an Electrical Rotating Machine

2017 ◽  
Vol 137 (11) ◽  
pp. 645-651
Author(s):  
Kotaro Mura ◽  
Toshihiro Tsuda ◽  
Tetsuo Yoshimitsu ◽  
Takuya Onishi ◽  
Shuichiro Hashimoto ◽  
...  
Keyword(s):  
Fundamental Study ◽  
Rotating Machine
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