Self-assembly of wedge-shaped PDMS substrate for the fabrication of variable line-space gratings

2021 ◽  
Vol 60 (08) ◽  
Author(s):  
Haitao Li ◽  
Kangni Wang ◽  
Linyong Qian
2015 ◽  
Author(s):  
HsinYu Tsai ◽  
Hiroyuki Miyazoe ◽  
Joy Cheng ◽  
Markus Brink ◽  
Simon Dawes ◽  
...  

2017 ◽  
Vol 46 (7) ◽  
pp. 4405-4413 ◽  
Author(s):  
Shijie Wang ◽  
Wei Deng ◽  
Yong Ann Seow ◽  
Bing Chen ◽  
Qun Ying Lin
Keyword(s):  

2015 ◽  
Author(s):  
Dung Quach ◽  
Valeriy V. Ginzburg ◽  
Mingqi Li ◽  
Janet Wu ◽  
Shih-wei Chang ◽  
...  

1992 ◽  
Vol 9 ◽  
pp. 247-254 ◽  
Author(s):  
Stuart Bowyer ◽  
Patrick Jelinsky ◽  
Carol Christian ◽  
Isabel Hawkins

AbstractThe Extreme Ultraviolet Explorer mission is described. For the first six months, an all-sky survey will be carried out covering 90 to 750 Å, or essentially the entire extreme ultraviolet (EUV) bandpass. This EUV survey will be made in four bands, or colors: λλ 90-150 Å, 170-250 Å, 400-600 Å, and 550-750 Å. A portion of the sky which is free from the normally intense 304 Å geocoronal helium background will be surveyed at greater sensitivity; the wavelength coverage of this band is from 90 to 400 Å. Following the sky survey portion of the mission, spectroscopy of individual sources will be carried out. Three spectrometers employing novel variable line-space gratings will provide spectra with ~1 Å resolution over the band from 70 to 760 Å. This spectroscopy will be carried out by guest observers chosen by NASA in a manner roughly analogous to the International Ultraviolet Explorer (IUE) guest observer program.


Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2443
Author(s):  
Tommaso Giammaria ◽  
Ahmed Gharbi ◽  
Anne Paquet ◽  
Paul Nealey ◽  
Raluca Tiron

This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding silicon oxide line/space patterns. The critical dimension (CD) of the silicon oxide line obtained can be easily trimmed by means of wet or dry etching: it allows a good control of the CD that permits finely tuning the guideline and the background dimensions. The chemical pattern that permits the DSA of the BCP is formed by a polystyrene (PS) guide and brush layers obtained with the grafting of the neutral layer polystyrene-random-polymethylmethacrylate (PS-r-PMMA). Moreover, data regarding the line edge roughness (LER) and line width roughness (LWR) are discussed with reference to the literature and to the stringent requirements of semiconductor technology.


1983 ◽  
Vol 22 (24) ◽  
pp. 3921 ◽  
Author(s):  
Michael C. Hettrick ◽  
Stuart Bowyer

2014 ◽  
Vol 123 ◽  
pp. 180-186 ◽  
Author(s):  
Boon Teik Chan ◽  
Shigeru Tahara ◽  
Doni Parnell ◽  
Paulina A. Rincon Delgadillo ◽  
Roel Gronheid ◽  
...  

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