Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance
2015 ◽
Vol 28
(1)
◽
pp. 119-124
◽
2018 ◽
Vol 6
(27)
◽
pp. 7267-7273
◽
2019 ◽
Vol 32
(1)
◽
pp. 161-167
◽
2015 ◽
Vol 54
(3)
◽
pp. 036506
◽
2008 ◽
Vol 47
(10)
◽
pp. 7822-7826
◽
2013 ◽
Vol 52
(1R)
◽
pp. 016501
◽
2011 ◽
Vol 50
(10R)
◽
pp. 106502
◽
2012 ◽
Vol 51
(8R)
◽
pp. 086504
◽