The effects of gravity and bolt-joint force on the optical design of a projection lens assembly

2016 ◽  
Author(s):  
Ming-Ying Hsu ◽  
Shenq-Tsong Chang ◽  
Ting-Ming Huang
2011 ◽  
Vol 40 (12) ◽  
pp. 1855-1859
Author(s):  
陈琛 CHEN Chen ◽  
李维善 LI Wei-shan ◽  
张禹 ZHANG Yu ◽  
刘宵婵 LIU Xiao-chan

2008 ◽  
Author(s):  
Qinhua Huang ◽  
Haobo Cheng ◽  
Yongtian Wang

2012 ◽  
Vol 41 (10) ◽  
pp. 1186-1192
Author(s):  
李维善 LI Wei-shan ◽  
陈琛 CHEN Chen ◽  
张禹 ZHANG Yu ◽  
刘宵婵 LIU Xiao-chan

1991 ◽  
Author(s):  
Atsuo Osawa ◽  
Kyohei Fukuda ◽  
Kouji Hirata

2013 ◽  
Vol 6 (4) ◽  
pp. 563-569
Author(s):  
李维善 LI Wei-shan ◽  
陈琛 CHEN Chen ◽  
于国辉 YU Guo-hui ◽  
李臣友 LI Chen-you ◽  
刘宵婵 LIU Xiao-chan ◽  
...  

2017 ◽  
Vol 38 (2) ◽  
pp. 523-526
Author(s):  
Luo Chunhua ◽  
Yue Pinliang ◽  
Zhang Donghu ◽  
Liang Jiuwei

2007 ◽  
Vol 364-366 ◽  
pp. 533-538
Author(s):  
Qing Hua Lin ◽  
Jin Yun Zhou ◽  
Wen Jing Li

For the 1:1 laser projection lithography system used to achieve large-area patterning with higher resolutions as well as higher throughput, the key parameters such as the laser beam geometry, the numerical aperture of projection lens, the laser source power and the pulse repetition rate are theoretically analyzed. It is expounded the process of uniform exposure in hexagonal beam shape, the advantages and limitations of 1:1 projection owing to numerical apertures deciding the resolution, as well as the cause of choosing larger laser power and pulse repetition rate. Meanwhile, the projection lens for a unit-magnification, refractive imaging system is tentatively simulationdesigned using ZEMAX optical design software. The optimized three-dimensional layout is plotted. For the designed results, the maximum optical path difference is smaller thanλ /4 within entire visual field. The resolution for feature sizes 10μm can be achieved within depth of focus 400μm by evaluating MTF. The maximum field curvature is within 10μm and the maximum distortion is small than 0.000007%. This fulfills the demands in technical specifications.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
John W. Coleman

In the design engineering of high performance electromagnetic lenses, the direct conversion of electron optical design data into drawings for reliable hardware is oftentimes difficult, especially in terms of how to mount parts to each other, how to tolerance dimensions, and how to specify finishes. An answer to this is in the use of magnetostatic analytics, corresponding to boundary conditions for the optical design. With such models, the magnetostatic force on a test pole along the axis may be examined, and in this way one may obtain priority listings for holding dimensions, relieving stresses, etc..The development of magnetostatic models most easily proceeds from the derivation of scalar potentials of separate geometric elements. These potentials can then be conbined at will because of the superposition characteristic of conservative force fields.


Author(s):  
G.Y. Fan ◽  
Bruce Mrosko ◽  
Mark H. Ellisman

A lens coupled CCD camera showing single electron sensitivity has been built for TEM applications. The design is illustrated in Fig. 1. The bottom flange of a JEM-4000EX microscope is replaced by a special flange which carries a large rectangular leaded glass window, 22 mm thick. A 20 μm thick layer of red phosphor is coated on the window, and the entire window is sputter-coated with a thin layer of Au/Pt. A two-lens relay system is used to provide efficient coupling between the image on the phosphor scintillator and the CCD imager. An f1.0 lens (Goerz optical) with front focal length 71.6 mm is used as the collector. A mirror prism, of the Amici type, is used to "bend" the optical path by 90° to prevent X-rays which may penetrate the leaded glass from hitting the CCD detector. Images may be relayed directly to the camera (1:1) or demagnified by a factor of up to 3:1 by moving the lens assembly.


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