Synchronous scan-projection lithography for fabricating cylindrical micro-parts

2016 ◽  
Author(s):  
Kaiki Ito ◽  
Yuta Suzuki ◽  
Toshiyuki Horiuchi
Keyword(s):  
Projection Lithography ◽  
Micro Parts ◽  
Synchronous Scan

Synchronous scan-projection lithography on overall circumference of fine pipes with a diameter of 2 mm

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GP13 ◽  
Author(s):  
Toshiyuki Horiuchi ◽  
Takahiro Furuhata ◽  
Hideyuki Muro
Keyword(s):  
Projection Lithography ◽  
Synchronous Scan

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Grid Method for Accuracy Study of Micro Parts Manufacturing

2011 ◽  
Vol 3 (3) ◽  
pp. 263-269 ◽  
Author(s):  
E. Minev ◽  
K. Popov ◽  
R. Minev ◽  
S. Dimov ◽  
V. Gagov
Keyword(s):  
Grid Method ◽  
Micro Parts ◽  
Accuracy Study ◽  
Parts Manufacturing

Development and characterization of AISI 316L micro parts produced by metal powder hot embossing

2021 ◽  
Vol 113 (1-2) ◽  
pp. 407-417
Author(s):  
Omid Emadinia ◽  
Maria Teresa Vieira ◽  
Manuel Fernando Vieira
Keyword(s):  
Metal Powder ◽  
Hot Embossing ◽  
Aisi 316L ◽  
Micro Parts

Manufacture of High Aspect Ratio Bulk Titanium Micro-Parts by Inductively Coupled Plasma Etching

2008 ◽  
Author(s):  
Gang Zhao ◽  
Qiong Shu ◽  
Yue Li ◽  
Jing Chen
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Inductively Coupled Plasma ◽  
Etching Rate ◽  
Sidewall Roughness ◽  
Inductively Coupled ◽  
Icp Etching ◽  
Novel Technology ◽  
Micro Parts ◽  
Etching Mask

A novel technology is developed to fabricate high aspect ratio bulk titanium micro-parts by inductively coupled plasma (ICP) etching. An optimized etching rate of 0.9 μm/min has been achieved with an aspect ratio higher than 10:1. For the first time, SU-8 is used as titanium etching mask instead of the traditional hard mask such as TiO2 or SiO2. With an effective selectivity of 3 and a spun-on thickness beyond 100 μm, vertical etching sidewall and low sidewall roughness are obtained. Ultra-deep titanium etching up to 200 μm has been realized, which is among the best of the present reports. Titanium micro-springs and planks are successfully fabricated with this approach.

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