Electrical properties of ZnO-based photodetector prepared by room temperature DC unbalanced magnetron sputtering

Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

Materials Science and Engineering B ◽

10.1016/j.mseb.2003.09.033 ◽

2004 ◽

Vol 106 (2) ◽

pp. 163-171 ◽

Cited By ~ 71

Author(s):

Ning Jiang ◽

Y.G Shen ◽

Y.-W Mai ◽

Tai Chan ◽

Simon C Tung

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Gas Pressure Dependence on Structural and Electrical Properties of Ni Thin Films on an Acrylonitrile-Butadiene-Styrene Resin Prepared Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

IEEJ Transactions on Sensors and Micromachines ◽

10.1541/ieejsmas.140.60 ◽

2020 ◽

Vol 140 (3) ◽

pp. 60-64

Author(s):

Masayuki Iwasaki ◽

Hiroshi Toyota

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Acrylonitrile Butadiene Styrene ◽

Inductively Coupled ◽

Unbalanced Magnetron ◽

Structural And Electrical Properties ◽

Butadiene Styrene

Tuning Optoelectronic Properties Through In‐Plane Arrangement and Point Defects in ZnO Nanorods as Prepared by Room‐Temperature DC‐Unbalanced Magnetron Sputtering

physica status solidi (a) ◽

10.1002/pssa.201800901 ◽

2019 ◽

Vol 216 (7) ◽

pp. 1800901

Author(s):

Muhammad A. K. Purbayanto ◽

Eka Nurfani ◽

Rena Widita ◽

Kouichi Takase ◽

Yudi Darma

Keyword(s):

Magnetron Sputtering ◽

Point Defects ◽

Room Temperature ◽

Zno Nanorods ◽

Optoelectronic Properties ◽

Microstructure and electrical properties of CoNX thin films deposited by unbalanced magnetron sputtering

Vacuum ◽

10.1016/s0042-207x(00)00453-x ◽

2001 ◽

Vol 62 (2-3) ◽

pp. 293-296 ◽

Cited By ~ 17

Author(s):

H Asahara ◽

T Migita ◽

T Tanaka ◽

K Kawabata

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Enhancement in green luminescence of ZnO nanorods grown by dc-unbalanced magnetron sputtering at room temperature

Optical Materials ◽

10.1016/j.optmat.2020.110418 ◽

2020 ◽

Vol 108 ◽

pp. 110418

Author(s):

Muhammad Abiyyu Kenichi Purbayanto ◽

Eka Nurfani ◽

Muhammad Avicenna Naradipa ◽

Rena Widita ◽

Andrivo Rusydi ◽

...

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Zno Nanorods ◽

Green Luminescence ◽

Structural, optical and electrical properties of amorphous carbon films deposited by pulsed unbalanced magnetron sputtering

Optik ◽

10.1016/j.ijleo.2015.02.047 ◽

2015 ◽

Vol 126 (7-8) ◽

pp. 861-864 ◽

Cited By ~ 13

Author(s):

H.Y. Dai ◽

X.R. Cheng ◽

C.F. Wang ◽

Y.C. Xue ◽

Z.P. Chen

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Optical And Electrical Properties ◽

Amorphous Carbon Films ◽

Tribological and Electrical Properties of Chromium-Doped Carbon Films Fabricated by Unbalanced Magnetron Sputtering for Medical Stents

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2019.16201 ◽

2019 ◽

Vol 19 (3) ◽

pp. 1415-1419 ◽

Cited By ~ 1

Author(s):

Ki-Noh Kang ◽

Jaehyeong Lee ◽

Kang Yeon Lee ◽

Yong Seob Park

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Carbon Films ◽

Tribological and Electrical Properties of Chromium Doped Diamond-Like Carbon Films Deposited by Unbalanced Magnetron Sputtering

Science of Advanced Materials ◽

10.1166/sam.2018.3041 ◽

2018 ◽

Vol 10 (3) ◽

pp. 429-432

Author(s):

Jaehyeong Lee ◽

Nam-Hoon Kim ◽

Soohyun Hwang ◽

Sung Hwan Hwang ◽

Yong Seob Park

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Carbon Films ◽

Diamond Like Carbon ◽

Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics