Tuning Optoelectronic Properties Through In‐Plane Arrangement and Point Defects in ZnO Nanorods as Prepared by Room‐Temperature DC‐Unbalanced Magnetron Sputtering

Enhancement in green luminescence of ZnO nanorods grown by dc-unbalanced magnetron sputtering at room temperature

Optical Materials ◽

10.1016/j.optmat.2020.110418 ◽

2020 ◽

Vol 108 ◽

pp. 110418

Author(s):

Muhammad Abiyyu Kenichi Purbayanto ◽

Eka Nurfani ◽

Muhammad Avicenna Naradipa ◽

Rena Widita ◽

Andrivo Rusydi ◽

...

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Zno Nanorods ◽

Green Luminescence ◽

Electrical properties of ZnO-based photodetector prepared by room temperature DC unbalanced magnetron sputtering

10.1117/12.2243831 ◽

2016 ◽

Cited By ~ 2

Author(s):

Eka Nurfani ◽

Angga Virdian ◽

Robi Kurniawan ◽

Shibghatullah Muhammady ◽

Inge M. Sutjahja ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Room Temperature ◽

Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

Materials Science and Engineering B ◽

10.1016/j.mseb.2003.09.033 ◽

2004 ◽

Vol 106 (2) ◽

pp. 163-171 ◽

Cited By ~ 71

Author(s):

Ning Jiang ◽

Y.G Shen ◽

Y.-W Mai ◽

Tai Chan ◽

Simon C Tung

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

TiN/NbN superlattice hard coatings deposited by unbalanced magnetron sputtering

10.1016/s0257-8972(98)00825-1 ◽

1999 ◽

Vol 113 (1-2) ◽

pp. 75-79 ◽

Cited By ~ 41

Author(s):

X.T. Zeng

Keyword(s):

Magnetron Sputtering ◽

Hard Coatings ◽

Synthesis of (Ti, Zr)N hard coatings by unbalanced magnetron sputtering

10.1016/s0257-8972(00)00675-7 ◽

2000 ◽

Vol 130 (1) ◽

pp. 64-68 ◽

Cited By ~ 30

Author(s):

Da-Yung Wang ◽

Chi-Lung Chang ◽

Cheng-Hsun Hsu ◽

Hua-Ni Lin

Keyword(s):

Magnetron Sputtering ◽

Hard Coatings ◽

The structural characteristics of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/0040-6090(96)08669-5 ◽

1996 ◽

Vol 281-282 ◽

pp. 436-440 ◽

Cited By ~ 10

Author(s):

H. Miyazaki ◽

F. Utsuno ◽

Y. Shigesato ◽

I. Yasui

Keyword(s):

Magnetron Sputtering ◽

Structural Characteristics ◽

High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

10.1016/0257-8972(90)90080-v ◽

1990 ◽

Vol 43-44 ◽

pp. 270-278 ◽

Cited By ~ 84

Author(s):

William D. Sproul ◽

Paul J. Rudnik ◽

Michael E. Graham ◽

Suzanne L. Rohde

Keyword(s):

Magnetron Sputtering ◽

Reactive Sputtering ◽

High Rate ◽

Closed Field ◽

Unbalanced Magnetron ◽

Sputtering System

Microstructure and friction behavior of LaF3 doped Ti-MoS2 composite thin films deposited by unbalanced magnetron sputtering

10.1016/j.surfcoat.2018.12.041 ◽

2019 ◽

Vol 359 ◽

pp. 334-341 ◽

Cited By ~ 3

Author(s):

Chao Zhang ◽

Biqi Yang ◽

Jian Wang ◽

Huifen Wang ◽

Gang Liu ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Friction Behavior ◽

Composite Thin Films ◽