Gas Pressure Dependence on Structural and Electrical Properties of Ni Thin Films on an Acrylonitrile-Butadiene-Styrene Resin Prepared Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

2020 ◽  
Vol 140 (3) ◽  
pp. 60-64
Author(s):  
Masayuki Iwasaki ◽  
Hiroshi Toyota
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Inductively Coupled Plasma ◽  
Acrylonitrile Butadiene Styrene ◽  
Inductively Coupled ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Structural And Electrical Properties ◽  
Butadiene Styrene

Low Resistivity Hafnium Nitride Thin Films Deposited by Inductively Coupled Plasma Assisted Magnetron Sputtering in Microelectronics

2021 ◽  
Vol 21 (7) ◽  
pp. 4129-4132
Author(s):  
Sung-Yong Chun
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Inductively Coupled Plasma ◽  
Columnar Structure ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Hafnium Nitride ◽  
Atomic Force ◽  
Structural And Electrical Properties

Hafnium nitride (HfN) thin films with low electrical resistivity were obtained by inductively coupled plasma assisted magnetron sputtering as a function of ICP power. Microstructural, crystallographic and sheet resistance characterizations of HfN films were performed by field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD) and 4 point probe method. The results show that ICP has significant effects on coating’s microstructure, structural and electrical properties of HfN films. With an increase in ICP power, thin film microstructure evolved from a porous columnar structure to a highly dense one. HfN thin films with different crystal structure and phases were obtained as a function of ICP power. The minimum resistivity of 125 µΩ-cm, the smoothest surface morphology with Ra roughness of 5.9 nm were obtained for the HfN films deposited at ICP power of 200 W.

Electrical properties of ZnO-based photodetector prepared by room temperature DC unbalanced magnetron sputtering

2016 ◽  
Author(s):  
Eka Nurfani ◽  
Angga Virdian ◽  
Robi Kurniawan ◽  
Shibghatullah Muhammady ◽  
Inge M. Sutjahja ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

2006 ◽  
Author(s):  
Junqi Xu ◽  
Lingxia Hang ◽  
Weiguo Liu ◽  
Huiqing Fan ◽  
Yingxue Xing
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Free Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Carbon Thin Films
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