Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

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Deposition of YBCO thin film with buffer layer by unbalanced magnetron sputtering

10.1117/12.300667 ◽

1998 ◽

Author(s):

Chunaeni Latief ◽

M. Barmawi

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Buffer Layer ◽

Ybco Thin Film ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Nanoimprinting of Ti–Cu-based thin-film metallic glasses deposited by unbalanced magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.11.174 ◽

2017 ◽

Vol 707 ◽

pp. 132-136 ◽

Author(s):

Junpei Kobata ◽

Ken-ichi Miura ◽

Kenji Amiya ◽

Yasuyuki Fukuda ◽

Yasunori Saotome

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Metallic Glasses ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Characteristics of Al Doped ZnO Films Prepared on Polyethylene Terephthalate Substrate by Unbalanced Magnetron Sputtering Method for Organic Thin Film Transistors

Science of Advanced Materials ◽

10.1166/sam.2015.2095 ◽

2015 ◽

Vol 7 (1) ◽

pp. 151-156

Author(s):

Jaehyeong Lee ◽

Yong Seob Park

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Transistors ◽

Organic Thin Film Transistors ◽

Zno Films ◽

Organic Thin Film ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Doped Zno ◽

Polyethylene Terephthalate Substrate

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Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Thin Solid Films ◽

10.1016/j.tsf.2013.02.058 ◽

2013 ◽

Vol 534 ◽

pp. 380-383 ◽

Author(s):

J.-S. Ko ◽

J.-K. Park ◽

W.-S. Lee ◽

J.-Y. Huh ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Diamond Film ◽

Cubic Boron Nitride ◽

Hydrogen Gas ◽

Nanocrystalline Diamond ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Double unbalanced magnetron sputtering system used for ion-assisted thin film deposition

Vacuum ◽

10.1016/s0042-207x(98)00144-4 ◽

1998 ◽

Vol 51 (2) ◽

pp. 119-126 ◽

Author(s):

S Groudeva-Zotova

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Nanocolumnar Composite Microstructure of Superhard SiC Thin Film Deposited Using Unbalanced Magnetron Sputtering Method

Advanced Engineering Materials ◽

10.1002/adem.201600008 ◽

2016 ◽

Vol 18 (7) ◽

pp. 1123-1126 ◽

Author(s):

K.-E. Bae ◽

K.-W. Chae ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Composite Microstructure

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The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.02.032 ◽

2013 ◽

Vol 223 ◽

pp. 75-78 ◽

Author(s):

J.-S. Ko ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Parameter Space ◽

Bias Voltage ◽

Cubic Boron Nitride ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Effect of Moisture in a Vacuum Chamber on the Deposition of c-BN Thin Film using an Unbalanced Magnetron Sputtering Method

Journal of the Korean Ceramic Society ◽

10.4191/kcers.2012.49.6.620 ◽

2012 ◽

Vol 49 (6) ◽

pp. 620-624 ◽

Author(s):

Eun-Sook Lee ◽

Jong-Keuk Park ◽

Wook-Seong Lee ◽

Tae-Yeon Seong ◽

Young-Joon Baik

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Vacuum Chamber ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Effect Of Moisture

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Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasing

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581146 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1331-1335 ◽

Author(s):

Wilfredo Otaño-Rivera ◽

Lawrence J. Pilione ◽

Juan A. Zapien ◽

Russell Messier

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Cubic Boron Nitride ◽

Thin Film Deposition ◽

Film Deposition ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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