Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler

Author(s):  
Jun Qian ◽  
Jonathan Manton ◽  
Sunil Bean ◽  
Peter Takacs ◽  
Lahsen Assoufid ◽  
...  
Keyword(s):  
X Ray ◽  
2013 ◽  
Vol 21 (1) ◽  
pp. 273-279 ◽  
Author(s):  
L. Xue ◽  
R. Reininger ◽  
Y.-Q. Wu ◽  
Y. Zou ◽  
Z.-M. Xu ◽  
...  

A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emission microscopy (PEEM). The two branches share the same plane-grating monochromator, which is equipped with four variable-line-spacing gratings and covers the 20–2000 eV energy range. Two elliptically polarized undulators are employed to provide photons with variable polarization, linear in every inclination and circular. The expected energy resolution is approximately 10 meV at 1000 eV with a flux of more than 3 × 1010 photons s−1at the ARPES sample positions. The refocusing of both branches is based on Kirkpatrick–Baez pairs. The expected spot sizes when using a 10 µm exit slit are 15 µm × 5 µm (horizontal × vertical FWHM) at the ARPES station and 10 µm × 5 µm (horizontal × vertical FWHM) at the PEEM station. The use of plane optical elements upstream of the exit slit, a variable-line-spacing grating and a pre-mirror in the monochromator that allows the influence of the thermal deformation to be eliminated are essential for achieving the ultrahigh-energy resolution.


2018 ◽  
Vol 43 (18) ◽  
pp. 4390 ◽  
Author(s):  
Zhong Yin ◽  
Heike Löchel ◽  
Jens Rehanek ◽  
Claudia Goy ◽  
Anton Kalinin ◽  
...  
Keyword(s):  
X Ray ◽  

2011 ◽  
Vol 18 (2) ◽  
pp. 134-142 ◽  
Author(s):  
V. N. Strocov ◽  
T. Schmitt ◽  
U. Flechsig ◽  
L. Patthey ◽  
G. S. Chiuzbăian

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  

2011 ◽  
Vol 43 (1) ◽  
pp. 105-112
Author(s):  
Z.G. Zhang ◽  
X.F. Wang ◽  
Q.Q. Tian

Bismuth silicate micro-crystals with grain array structure were prepared by sintering method under atmosphere pressure. The samples were characterized for structural and surface morphological properties by X-ray diffraction (XRD) and Environmental scanning electron microscopy (ESEM). The result shows that stable grain arrays grow by iterative mode. If a stable grain array eliminates, a new stable grain array will generate. In a stable parent array, an offspring array may generate after the corresponding partial elimination of its parent array. If one part of an offspring array stops growing, it will be as a new parent array, and then its offspring grain array will create. The sum of the lengths of an offspring array and the corresponding eliminated part of its parent array is equal to the length of the next eliminated part of its parent array. It means the growth rate of an offspring array is equal to that of the corresponding survived part of its parent array. There is a highly correlation between grain array length and average grain line spacing. It means that larger average grain line spacing corresponds to the stable grain array with lager length. When average grain line spacing increases 1?m, the corresponding array length will increase approximately 7.6?m.


2015 ◽  
Vol 22 (2) ◽  
pp. 328-335 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Yong Wang ◽  
...  

A new monochromator called an extra-focus constant-included-angle varied-line-spacing (VLS) cylindrical-grating monochromator (extra-focus CIA-VCGM) is described. This monochromator is based on the Hettrick–Underwood scheme where the plane VLS grating is replaced by a cylindrical one in order to zero the defocus at three reference photon energies in the vacuum-ultraviolet range. It has a simple mechanical structure and a fixed focus spot with high performance over a wide energy range. Furthermore, its mechanical compatibility with a standard VLS plane-grating monochromator allows convenient extension into the soft-X-ray range.


1998 ◽  
Vol 5 (3) ◽  
pp. 536-538 ◽  
Author(s):  
Takeshi Nakatani ◽  
Yuji Saitoh ◽  
Yuden Teraoka ◽  
Tetsuo Okane ◽  
Akinari Yokoya

An undulator beamline for spectroscopy studies focusing on the electronic structure of actinide materials is under construction. Linearly or circularly polarized soft X-rays are provided by employing a variably polarizing undulator. Varied-line-spacing plane gratings and a sagittal-focusing system are used to monochromatize the undulator beam, whose energy ranges from 0.3 to 1.5 keV. A resolving power of 104 is expected in the whole energy region. These components are methodically operated by the SPring-8 beamline control system. There are three experimental stations in the beamline. In one of the stations the photoemission spectroscopy experiments are carried out at a radioisotope-controlled area where actinide compounds as well as unsealed radioactive materials are usable. Other experimental stations are planned in the beamline for surface photochemical reactions and biological applications.


2015 ◽  
Vol 22 (6) ◽  
pp. 1353-1358 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Zhi Guo ◽  
...  

A new monochromator scheme is presented in which an extra-focus constant-included-angle varied-line-spacing cylindrical-grating monochromator (extra-focus CIA-VCGM) is conveniently combined with a variable-included-angle varied-line-spacing plane-grating monochromator (VIA-VPGM). This dual-mode solution delivers high performance in the energy range from vacuum ultraviolet (VUV) to soft X-ray. The resolving power and the efficiency of this dual-mode grating monochromator are analyzed in detail based on realistic parameters. Comparisons with the commonly used variable-included-angle plane-grating monochromator and normal-incidence monochromator (VIA-PGM/NIM) hybrid monochromator are made.


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