Ripple formation in excimer laser-irradiated silicon dioxide/silicon system

1998 ◽  
Author(s):  
J. J. Yu ◽  
Yongfeng Lu
Keyword(s):  
Silicon Dioxide ◽  
Excimer Laser ◽  
Ripple Formation ◽  
Silicon System

Excimer-laser-induced micropatterning of silicon dioxide on silicon substrates

2001 ◽  
Vol 72 (1) ◽  
pp. 35-39 ◽  
Author(s):  
J.J. Yu ◽  
J.Y. Zhang ◽  
I.W. Boyd ◽  
Y.F. Lu
Keyword(s):  
Silicon Dioxide ◽  
Excimer Laser ◽  
Silicon Substrates

Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

1998 ◽  
Vol 37 (Part 1, No. 9A) ◽  
pp. 4938-4942 ◽  
Author(s):  
Atsushi Maruyama ◽  
Naoki Tanaka ◽  
Kazuhiro Nakata ◽  
Ken Yukimura ◽  
Shinzo Yoshikado ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Arf Excimer Laser

Excimer laser initiated chemical vapor deposition of tungsten films on silicon dioxide

1987 ◽  
Vol 61 (6) ◽  
pp. 2365-2373 ◽  
Author(s):  
Akira Shintani ◽  
Susumu Tsuzuku ◽  
Eisuke Nishitani ◽  
Mitsuo Nakatani
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Initiated Chemical Vapor Deposition

Physical and Dielectric Properties of the Metal-Silicon Dioxide-Silicon System

1962 ◽  
Vol 109 (2) ◽  
pp. 94 ◽  
Author(s):  
J. L. Sprague ◽  
J. A. Minahan ◽  
O. J. Wied
Keyword(s):  
Dielectric Properties ◽  
Silicon Dioxide ◽  
Silicon System

Pulsed KrF excimer laser dopant activation in nanocrystal silicon in a silicon dioxide matrix

2016 ◽  
Vol 108 (8) ◽  
pp. 083103 ◽  
Author(s):  
Tian Zhang ◽  
Brian Simonds ◽  
Keita Nomoto ◽  
Binesh Puthen Veettil ◽  
Ziyun Lin ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Excimer Laser ◽  
Dopant Activation ◽  
Silicon Dioxide Matrix ◽  
Krf Excimer Laser

High Rate Deposition of Silicon Dioxide Membrane by Excimer Laser Enhanced Projection Chemical Vapor Deposition from Organic Compounds at Low Temperature

1993 ◽  
Vol 32 (Part 1, No. 6B) ◽  
pp. 3109-3112 ◽  
Author(s):  
Seiichirou Tomoura ◽  
Kouji Takashima ◽  
Kazuyuki Minami ◽  
Masaki Esashi ◽  
Jun-ichi Nishizawa
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Silicon Dioxide ◽  
Organic Compounds ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Rate
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