High-resolution multigrating spectrometer for high-quality deep-UV light source production

2000 ◽  
Author(s):  
Toru Suzuki ◽  
Takanori Nakaike ◽  
Osamu Wakabayashi ◽  
Hakaru Mizoguchi
Keyword(s):  
High Resolution ◽  
Light Source ◽  
Uv Light ◽  
High Quality ◽  
Deep Uv

High-resolution multigrating spectrometer for high-quality deep-UV light source production

2001 ◽  
Author(s):  
Toru Suzuki ◽  
Hirokazu Kubo ◽  
Takashi Suganuma ◽  
Toshio Yamashita ◽  
Osamu Wakabayashi ◽  
...  
Keyword(s):  
High Resolution ◽  
Light Source ◽  
Uv Light ◽  
High Quality ◽  
Deep Uv

scholarly journals High-sensitive and fast response to 255 nm deep-UV light of CH 3 NH 3 PbX 3 (X = Cl, Br, I) bulk crystals

2018 ◽  
Vol 5 (9) ◽  
pp. 180905 ◽  
Author(s):  
Zhaojun Zhang ◽  
Wei Zheng ◽  
Richeng Lin ◽  
Feng Huang
Keyword(s):  
Homeland Security ◽  
Electronic Transport ◽  
Uv Light ◽  
Fast Response ◽  
Important Application ◽  
Bulk Crystals ◽  
High Quality ◽  
Fast Speed ◽  
Deep Uv ◽  
Speed Response

Deep-UV light detection has important application in surveillance and homeland security regions. CH 3 NH 3 PbX 3 (X = Cl, Br, I) materials have outstanding optical absorption and electronic transport properties suitable for obtaining excellent deep-UV photoresponse. In this work, we have grown high-quality CH 3 NH 3 PbX 3 (X = Cl, Br, I) bulk crystals and used them to fabricate photodetectors. We found that they all have high-sensitive and fast-speed response to 255 nm deep-UV light. Their responsivities are 10–10 3 times higher than MgZnO and Ga 2 O 3 detectors, and their response speeds are 10 3 times faster than Ga 2 O 3 and ZnO detectors. These results indicate a new promising route for deep-UV detection.

A High Resolution Scanning Microscope

1968 ◽  
Vol 26 ◽  
pp. 356-357
Author(s):  
A. V. Crewe ◽  
J. Wall ◽  
L. M. Welter
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Spherical Aberration ◽  
Focal Length ◽  
Spot Size ◽  
Emission Source ◽  
Field Of View ◽  
Scanning Microscope ◽  
Magnetic Lens ◽  
High Quality

A scanning microscope using a field emission source has been described elsewhere. This microscope has now been improved by replacing the single magnetic lens with a high quality lens of the type described by Ruska. This lens has a focal length of 1 mm and a spherical aberration coefficient of 0.5 mm. The final spot size, and therefore the microscope resolution, is limited by the aberration of this lens to about 6 Å.The lens has been constructed very carefully, maintaining a tolerance of + 1 μ on all critical surfaces. The gun is prealigned on the lens to form a compact unit. The only mechanical adjustments are those which control the specimen and the tip positions. The microscope can be used in two modes. With the lens off and the gun focused on the specimen, the resolution is 250 Å over an undistorted field of view of 2 mm. With the lens on,the resolution is 20 Å or better over a field of view of 40 microns. The magnification can be accurately varied by attenuating the raster current.

Organic Light Emitting Diodes - Innovative Light Sources

2019 ◽  
pp. 101-107
Author(s):  
Sergei A. Stakharny
Keyword(s):  
Light Source ◽  
Organic Light Emitting Diodes ◽  
Organic Leds ◽  
Light Sources ◽  
High Quality ◽  
Light Emitting ◽  
Organic Light ◽  
Lighting Systems ◽  
Physical Principles ◽  
Prospects Of Application

This article is a review of the new light source – organic LEDs having prospects of application in general and special lighting systems. The article describes physical principles of operation of organic LEDs, their advantages and principal differences from conventional non-organic LEDs and other light sources. Also the article devoted to contemporary achievements and prospects of development of this field in the spheres of both general and museum lighting as well as other spheres where properties of organic LEDs as high-quality light sources may be extremely useful.

Development of a UV Light Source using Pr:LuAG Thin Film Target Pumped by Electron Beam

2015 ◽  
Vol 135 (9) ◽  
pp. 1049-1054
Author(s):  
Norio Ichikawa ◽  
Kohei Ikeda ◽  
Yoshinori Honda ◽  
Hiroyuki Taketomi ◽  
Koji Kawai ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Light Source ◽  
Uv Light

Aeromagnetic survey in central West Greenland: project Aeromag 2001

2002 ◽  
pp. 67-72 ◽  
Author(s):  
Thorkild M. Rasmussen
Keyword(s):  
High Resolution ◽  
Magnetic Measurements ◽  
Geophysical Data ◽  
High Quality ◽  
Aeromagnetic Survey ◽  
Original Series ◽  
West Greenland ◽  
Airborne Measurements ◽  
Geophysical Surveys ◽  
Airborne Geophysical Data

NOTE: This article was published in a former series of GEUS Bulletin. Please use the original series name when citing this article. Rasmussen, T. M. (1). Aeromagnetic survey in central West Greenland: project Aeromag 2001. Geology of Greenland Survey Bulletin, 191, 67-72. https://doi.org/10.34194/ggub.v191.5130 The series of government-funded geophysical surveys in Greenland was continued during the spring and summer of 2001 with a regional aeromagnetic survey north of Uummannaq, project Aeromag 2001 (Fig. 1). The survey added about 70 000 line kilometres of high-quality magnetic measurements to the existing database of modern airborne geophysical data from Greenland. This database includes both regional high-resolution aeromagnetic surveys and detailed surveys with combined electromagnetic and magnetic airborne measurements.

High-resolution deep-UV laser mask repair based on near-field optical technology

1996 ◽  
Author(s):  
Klony S. Lieberman ◽  
Hanan Terkel ◽  
Michael Rudman ◽  
A. Ignatov ◽  
Aaron Lewis
Keyword(s):  
High Resolution ◽  
Near Field ◽  
Uv Laser ◽  
Optical Technology ◽  
Deep Uv
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