Double-step process for manufacturing reticle to reduce gate CD variation

2001 ◽  
Author(s):  
Makoto Kozuma ◽  
Masaya Komatsu ◽  
Rieko Arakawa ◽  
Seiji Kubo ◽  
Tatsuya Takahashi ◽  
...  
Keyword(s):  
2009 ◽  
Vol 90 (4) ◽  
pp. 599-605 ◽  
Author(s):  
D. Samios ◽  
F. Pedrotti ◽  
A. Nicolau ◽  
Q.B. Reiznautt ◽  
D.D. Martini ◽  
...  
Keyword(s):  

2020 ◽  
Vol 124 (24) ◽  
pp. 13447-13455 ◽  
Author(s):  
Thomas Cossuet ◽  
Estelle Appert ◽  
Odette Chaix-Pluchery ◽  
Hervé Roussel ◽  
Laetitia Rapenne ◽  
...  

Fuel ◽  
2012 ◽  
Vol 92 (1) ◽  
pp. 197-203 ◽  
Author(s):  
Rafael Guzatto ◽  
Diego Defferrari ◽  
Quelen Bülow Reiznautt ◽  
Ígor Renz Cadore ◽  
Dimitrios Samios

2015 ◽  
Vol 58 ◽  
pp. 61-70 ◽  
Author(s):  
Paul B. Larsen

Ethylene is the simplest unsaturated hydrocarbon, yet it has profound effects on plant growth and development, including many agriculturally important phenomena. Analysis of the mechanisms underlying ethylene biosynthesis and signalling have resulted in the elucidation of multistep mechanisms which at first glance appear simple, but in fact represent several levels of control to tightly regulate the level of production and response. Ethylene biosynthesis represents a two-step process that is regulated at both the transcriptional and post-translational levels, thus enabling plants to control the amount of ethylene produced with regard to promotion of responses such as climacteric flower senescence and fruit ripening. Ethylene production subsequently results in activation of the ethylene response, as ethylene accumulation will trigger the ethylene signalling pathway to activate ethylene-dependent transcription for promotion of the response and for resetting the pathway. A more detailed knowledge of the mechanisms underlying biosynthesis and the ethylene response will ultimately enable new approaches to be developed for control of the initiation and progression of ethylene-dependent developmental processes, many of which are of horticultural significance.


2008 ◽  
Author(s):  
Shenghua Luan ◽  
Shuli Yu
Keyword(s):  

1987 ◽  
Vol 58 (02) ◽  
pp. 786-789 ◽  
Author(s):  
O Behnke

SummaryAdhesion of rat blood platelets to native rat tail collagen fibrils was studied in the electron microscope under conditions that preserved collagen-associated proteoglycans (CAPG). The CAPG molecules were aligned in chain-like configurations that encircled the fibrils with a 65 nm period; they appeared to coat the fibrils completely and extended 60-100 nm away from the fibril. The initial platelet-fibril contact occurred between the platelet glycocalyx and the CAPG of the fibrils i.e. between two surfaces with net-negative charges. When close contact was established between the fibril surface proper and the platelet membrane, CAPG were not identified in the area of contact, and the collagen-platelet distance was reduced to a ~10-12 nm wide gap traversed by delicate links in register with fibril periodicities.


2020 ◽  
Author(s):  
Elbruz Murat Baba ◽  
Jose Montero ◽  
Dmitrii Moldarev ◽  
Marcos V. Moro ◽  
Max Wolff ◽  
...  

<p>We report preferential orientation control in photochromic gadolinium oxyhydride (GdHO) thin films deposited by a two-step process. Gadolinium hydride (GdH<sub>2-x</sub>) films were grown by reactive magnetron sputtering, followed by oxidation in air. The preferential orientation, grain size, anion concentrations, and photochromic response of the films are strongly dependent on the deposition pressure. GdHO films show preferential orientation along the [100] direction and exhibit photochromism when synthesized at deposition pressures up to 5.8 Pa and. The photochromic contrast is larger than 20 % when the films are deposited below 2.8 Pa with 0.22 H<sub>2</sub>/Ar flow ratio. We argue that the degree of preferential orientation defines the oxygen concentration which is known to be a key parameter for photochromism in rare-earth oxyhydride thin films. The experimental observations described above are explained by the oxidation-induced decrease of the grain size as a result of the increase of the deposition pressure of the sputtering gas. </p>


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