Transparency vs. efficiency in 193-nm photoacid generator design

2002 ◽  
Author(s):  
Gerd Pohlers ◽  
Yasuhiro Suzuki ◽  
Nicholas Chan ◽  
James F. Cameron
Keyword(s):  
Generator Design ◽  
193 Nm ◽  
Photoacid Generator

Overview of photoacid generator design for acetal resist systems

1997 ◽  
Author(s):  
Francis M. Houlihan ◽  
Omkaram Nalamasu ◽  
Elsa Reichmanis ◽  
Allen G. Timko ◽  
Ulrike Varlemann ◽  
...  
Keyword(s):  
Generator Design ◽  
Photoacid Generator

Progress in 193-nm Single Layer Resists: The role of Photoacid Generator Structure on the Performance of Positive Resists

1998 ◽  
pp. 224-236 ◽  
Author(s):  
Robert D. Allen ◽  
Juliann Opitz ◽  
Carl E. Larson ◽  
Thomas I. Wallow ◽  
Richard A. DiPietro ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm ◽  
Photoacid Generator

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm
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