Advanced computational modeling for growing III-V materials in a high-pressure chemical vapor-deposition reactor
1999 ◽
Vol 146
(8)
◽
pp. 2901-2905
◽
Keyword(s):
Keyword(s):
1999 ◽
Vol 29
(8)
◽
pp. 65-80
◽
2005 ◽
Vol 23
(4)
◽
pp. 1221-1227
◽
Keyword(s):