Characterization of InN layers grown by high-pressure chemical vapor deposition

2006 ◽  
Vol 89 (11) ◽  
pp. 112119 ◽  
Author(s):  
M. Alevli ◽  
G. Durkaya ◽  
A. Weerasekara ◽  
A. G. U. Perera ◽  
N. Dietz ◽  
...  
Keyword(s):  
High Pressure ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Pressure Chemical

Optical characterization of InN layers grown by high-pressure chemical vapor deposition

2008 ◽  
Vol 26 (4) ◽  
pp. 1023-1026 ◽  
Author(s):  
M. Alevli ◽  
R. Atalay ◽  
G. Durkaya ◽  
A. Weesekara ◽  
A. G. U. Perera ◽  
...  
Keyword(s):  
High Pressure ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Optical Characterization ◽  
Pressure Chemical

scholarly journals Characterization of TiN film grown by low-pressure-chemical-vapor-deposition

1997 ◽  
Vol 308-309 ◽  
pp. 594-598 ◽  
Author(s):  
Y.J Mei ◽  
T.C Chang ◽  
J.C Hu ◽  
L.J Chen ◽  
Y.L Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Tin Film ◽  
Pressure Chemical

scholarly journals Generation of InN nanocrystals in organic solution through laser ablation of high pressure chemical vapor deposition-grown InN thin film

2012 ◽  
Vol 14 (8) ◽  
Author(s):  
Sabri Alkis ◽  
Mustafa Alevli ◽  
Salamat Burzhuev ◽  
Hüseyin Avni Vural ◽  
Ali Kemal Okyay ◽  
...  
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Chemical Vapor Deposition ◽  
Laser Ablation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Solution ◽  
Pressure Chemical

scholarly journals Conformal coating of amorphous silicon and germanium by high pressure chemical vapor deposition for photovoltaic fabrics

APL Materials ◽  
2018 ◽  
Vol 6 (4) ◽  
pp. 046105 ◽  
Author(s):  
Xiaoyu Ji ◽  
Hiu Yan Cheng ◽  
Alex J. Grede ◽  
Alex Molina ◽  
Disha Talreja ◽  
...  
Keyword(s):  
High Pressure ◽  
Chemical Vapor Deposition ◽  
Amorphous Silicon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Conformal Coating ◽  
Pressure Chemical ◽  
Silicon And Germanium

Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor

2008 ◽  
Vol 516 (18) ◽  
pp. 6330-6335 ◽  
Author(s):  
Xuemei Song ◽  
Deepthi Gopireddy ◽  
Christos G. Takoudis
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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