Plasma-chemical treatment effect observed during the fabrication of AlGaN/GaN devices

2015 ◽  
Vol 9 (4) ◽  
pp. 684-693 ◽  
Author(s):  
K. L. Enisherlova ◽  
V. S. Kulikauskas ◽  
L. A. Seidman ◽  
V. V. Pishchagin ◽  
A. M. Konovalov ◽  
...  
Keyword(s):  
Treatment Effect ◽  
Chemical Treatment ◽  
Plasma Chemical

The influence of plasma chemical treatment of nickel and nickel-rhenium catalysts deposited on sibunite on their activity in dehydrogenation

2007 ◽  
Vol 81 (5) ◽  
pp. 696-700 ◽  
Author(s):  
A. A. Trofimova ◽  
M. A. Ryashentseva ◽  
N. Yu. Isaeva ◽  
T. V. Yagodovskaya ◽  
V. D. Yagodovskii
Keyword(s):  
Chemical Treatment ◽  
Plasma Chemical

Surface Chemical Treatment Effect On (111) PbSnTe Topological Crystalline Insulator Films

2021 ◽  
pp. 150930
Author(s):  
A.S. Tarasov ◽  
D.V. Ishchenko ◽  
I.O. Akhundov ◽  
V.A. Golyashov ◽  
A.E. Klimov ◽  
...  
Keyword(s):  
Treatment Effect ◽  
Chemical Treatment ◽  
Surface Chemical ◽  
Topological Crystalline Insulator

AES Investigation of Chemical Treatment Effect on CdTe and CdZnTe Surfaces

1998 ◽  
Vol 33 (3) ◽  
pp. 401-408 ◽  
Author(s):  
A. Iller ◽  
G. Karczewski ◽  
G. Karczewski ◽  
G. Kolmhofer ◽  
E. Łusakowska ◽  
...  
Keyword(s):  
Treatment Effect ◽  
Chemical Treatment

scholarly journals Masking coating formation by the focused ion beams method for plasma chemical treatment

2018 ◽  
Vol 1124 ◽  
pp. 081035 ◽  
Author(s):  
I N Kots ◽  
V S Klimin ◽  
V V Polyakova ◽  
A A Rezvan ◽  
Z E Vakulov ◽  
...  
Keyword(s):  
Chemical Treatment ◽  
Ion Beams ◽  
Focused Ion Beams ◽  
Plasma Chemical ◽  
Coating Formation

Chemical Treatment Effect of Si(111) Surfaces inH2SO4:H2O2Solution

1996 ◽  
Vol 35 (Part 1, No. 12A) ◽  
pp. 5925-5928 ◽  
Author(s):  
Kazuyuki Kobayashi ◽  
Hiroyuki Unno ◽  
Hidekazu Takizawa ◽  
Sadao Adachi
Keyword(s):  
Treatment Effect ◽  
Chemical Treatment

scholarly journals STUDYING THE INFLUENCE OF PLASMA-CHEMICAL AND OZONE TREATMENT ON ARTIFICIALLY IMPLEMENTED MICROFLORA IN MODEL AQUEOUS SOLUTIONS

2021 ◽  
pp. 177-182
Author(s):  
G.V. Taran ◽  
D.V. Kudin ◽  
O.O. Zamuriev ◽  
P.О. Opalev ◽  
М.О. Yaroshenko ◽  
...  
Keyword(s):  
Escherichia Coli ◽  
Aqueous Solution ◽  
Aspergillus Flavus ◽  
Chemical Treatment ◽  
Ozone Treatment ◽  
Plasma Chemical ◽  
Bacteriostatic Effect ◽  
Pilot Studies ◽  
Test Culture ◽  
Time Parameters

The pilot studies have been conducted to determine the biocidal effects of ozone and plasma chemical treatment for 1, 2, and 3 h on the strain “Moldavian” of infectious rhinotracheitis virus, reference strain of Escherichia coli ATCC 25922, atypical mycobacteria of the species Mycobacusleum phlei and archival strain of Aspergillus flavus artificially introduced into aqueous solution. It is shown that both treatments of aqueous solution contaminated with infectious rhinotracheitis virus have virucidal properties at the level of 95…100%. It was found that bactericidal (bacteriostatic) effect of ozone treatment for Escherichia coli fluid was 100% for all the time parameters. For plasma chemical treatment, the bacteriostatic effect (23%) was shown after the treatment within 3 h. The bactericidal (bacteriostatic) effect of ozone treatment for water samples contaminated with mycobacteria of the species M. phlei was only 65% at the treatment for 3 h. There was no bacteriostatic effect for plasma chemical treatment at any exposure. When studying the fungicidal (fungistatic) properties of ozone treatment for aqueous solution contaminated with a test culture of Aspergillus flavus, fungicidal properties were established (growth retardation by 95…98%). No fungicidal or fungistatic properties were shown for plasma chemical treatment.

scholarly journals Study of the conditions for the effective initiation of plasma-chemical treatment of flue gas under the influence of a pulsed electron beam

2020 ◽  
Vol 38 (3) ◽  
pp. 197-203 ◽  
Author(s):  
G. Kholodnaya ◽  
I. Egorov ◽  
R. Sazonov ◽  
M. Serebrennikov ◽  
A. Poloskov ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Electron Beam ◽  
Water Vapor ◽  
Flue Gas ◽  
Chemical Treatment ◽  
Drift Chamber ◽  
Gas Mixture ◽  
Plasma Chemical ◽  
Pulsed Electron Beam ◽  
Beam Transmission

AbstractThis paper presents the results of comprehensive studies of the efficiency of a pulsed electron beam transmission through a mixture of gases: nitrogen (83%), carbon dioxide (14%), and oxygen (2.6%) in the presence of ash and water vapor. The studied concentrations correspond to the concentrations of nitrogen, oxygen, and carbon dioxide in flue gas. The pressure and concentration of water vapor and ash in the drift chamber varied (375, 560, and 750 Torr; humidity 15 ± 5% and 50 ± 15%). The charge dissipation of a pulsed electron beam in the gas mixture in the presence of ash and water vapor was investigated, as well as the effect of the concentration of water vapor and ash on the geometric profile of the pulsed electron beam.

Plasma-Chemical Treatment of Process Gases with Low-Concentration Fluorine-Containing Components

2016 ◽  
Vol 37 (1) ◽  
pp. 273-286
Author(s):  
H. S. Park ◽  
S. P. Vaschenko ◽  
E. V. Kartaev ◽  
D. Yu. Batomunkuev
Keyword(s):  
Chemical Treatment ◽  
Plasma Chemical ◽  
Low Concentration ◽  
Process Gases
Sign in / Sign up

Export Citation Format

Share Document