Structural and physical properties of boron doped ZnO films prepared by chemical spray pyrolysis method

2015 ◽  
Vol 60 (6) ◽  
pp. 946-950 ◽  
Author(s):  
S. Kerli ◽  
U. Alver ◽  
A. Tanriverdi ◽  
B. Avar
Keyword(s):  
Physical Properties ◽  
Spray Pyrolysis ◽  
Zno Films ◽  
Spray Pyrolysis Method ◽  
Chemical Spray Pyrolysis ◽  
Boron Doped ◽  
Pyrolysis Method ◽  
Chemical Spray ◽  
Doped Zno

scholarly journals Study of Physical Properties of Zn1-xAgxO Thin Films Deposited by Chemical Spray Pyrolysis

2018 ◽  
Vol 34 (5) ◽  
pp. 2667-2670 ◽  
Author(s):  
Bhawna Sarwan ◽  
Aman Deep Acharya
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Physical Properties ◽  
Spray Pyrolysis ◽  
Optical Measurement ◽  
Filler Concentration ◽  
Spray Pyrolysis Method ◽  
Chemical Spray Pyrolysis ◽  
Pyrolysis Method ◽  
Chemical Spray

To investigate the influence of Ag concentration on physical properties, the Zn1-xAgxO films were synthesized by chemical spray pyrolysis method. The crystallite size was found to decrease for low concentration of Ag then increase upto 50 nm with increase in Ag content. AFM measurement implies that the roughness and grain size increased due to coalescence of petite grains into larger size. In optical measurement, band gap is found to be decreased with increase in filler concentration.

scholarly journals Preparation and Characterization of Transparent Conducting FTO Thin Films by Chemical Spray Pyrolysis Method

2018 ◽  
Vol 4 (5) ◽  
pp. 572-574 ◽  
Author(s):  
Ebitha Eqbal ◽  
E. Hilal Rahman ◽  
E.I. Anila
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Deep Level ◽  
Spray Pyrolysis Method ◽  
Near Band Edge ◽  
Chemical Spray Pyrolysis ◽  
Homogeneous Surface ◽  
Orthorhombic Crystal Structure ◽  
Pyrolysis Method ◽  
Chemical Spray

Fluorine doped tin oxide (FTO) thin films were synthesized by chemical spray pyrolysis method on glass substrates for 10 at.%, 15 at.%, 20 at.% of fluorine doping concentrations. Their structural, optical and electrical properties were investigated. X-ray diffraction (XRD) study shows polycrystalline nature of the films with orthorhombic crystal structure. The grain size (D) was observed in the range of 14 nm to 30 nm. The FESEM images of the FTO thin films reveals that the films have smooth and homogeneous surface morphology with thin granular grains distributed throughout the surface. EDX analysis confirms the presence of Sn, O and F elements in the prepared FTO thin films. Photoluminescence (PL) spectrum shows a broad emission which covers near band edge (NBE) as well as deep level emissions (DLE) in the region 380 nm and 620 nm. From the hall effect measurements, it was observed that all the films exhibit n-type conductivity. The sample grown with 10 at. % of fluorine showed the highest transmission percentage (80%) with high mobility and conductivity, which are basic requirements for a TCO.

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