Preparation and testing of silicon nanowires

2014 ◽  
Vol 92 (7/8) ◽  
pp. 819-821 ◽  
Author(s):  
Martin Müller ◽  
Jan Kočka ◽  
Hassan G. El Gohary ◽  
Jiri Stuchlik ◽  
Ha Stuchlikova ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Chemical Vapour Deposition ◽  
Silicon Nanowires ◽  
Vapour Deposition ◽  
Hydrogen Plasma ◽  
Chemical Vapour ◽  
Applied Potential ◽  
Gold Nanoislands

Here we present two ways of preparing lateral (in plane) silicon nanowires with the help of gold nanoislands catalysed plasma enhanced chemical vapour deposition. The role of the applied potential and eventual consecutive hydrogen plasma treatment is tested together with the thickness of the thin Au layer used for self-organised preparation of Au nanoislands.

Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition

1992 ◽  
Vol 31 (Part 2, No. 8B) ◽  
pp. L1191-L1194 ◽  
Author(s):  
Yusuke Mori ◽  
Masahiro Deguchi ◽  
Nobuhiro Eimori ◽  
Jing Shing Ma ◽  
Kazuhito Nishimura ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Hydrogen Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Implantation Damage

The role of the buffer gas in the ArF laser chemical vapour deposition of silicon oxide

1993 ◽  
Vol 230 (1) ◽  
pp. 35-38 ◽  
Author(s):  
P. González ◽  
J. Pou ◽  
D. Fernández ◽  
E. García ◽  
J. Serra ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Silicon Oxide ◽  
Chemical Vapour ◽  
Buffer Gas ◽  
Arf Laser
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