GEOMETRY AND BIAS DEPENDENCE OF LOW-FREQUENCY RANDOM TELEGRAPH SIGNAL AND 1/f NOISE LEVELS IN MOSFETS
2005 ◽
Vol 05
(04)
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pp. L539-L548
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Keyword(s):
Low-frequency noise in MOSFETs is considered to originate from two distinctive sources: Random Telegraph Signal caused by carrier traps at the border of the SiO 2/ Si interface and 1/f fluctuation due to inherent nature of lattice scattering in a Si crystal. It is very important to distinguish these two mechanisms. Relative amplitude of RTS and 1/f noise depends on the number of carriers under the gate electrode, which makes it channel size as well as gate-bias dependent. In this paper, we discuss the dependence of the amplitudes of RTS and 1/f noise in MOSFETs on sample geometry and gate bias condition. We discuss low-frequency noise reduction by utilizing low electron-temperature plasma for gate oxidation as well.
2001 ◽
Vol 18
(1)
◽
pp. 40-43
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2014 ◽
Vol 1044-1045
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pp. 1251-1257
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2011 ◽
Vol 10
(3)
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pp. 402-408
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Keyword(s):
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1989 ◽
Vol 8
(2)
◽
pp. 30-39
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Keyword(s):
1993 ◽
Vol 63
(1-4)
◽
pp. 285-290
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Keyword(s):
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2010 ◽
Vol 50
(2)
◽
pp. 20302