Projection Exposure with Variable Axis Immersion Lenses: A High-Throughput Electron Beam Approach to “Suboptical” Lithography

1995 ◽  
Vol 34 (Part 1, No. 12B) ◽  
pp. 6658-6662 ◽  
Author(s):  
Hans C. Pfeiffer
Keyword(s):  
Electron Beam ◽  
High Throughput

Reflective electron-beam lithography: progress toward high-throughput production capability

2012 ◽  
Author(s):  
Regina Freed ◽  
Thomas Gubiotti ◽  
Jeff Sun ◽  
Francoise Kidwingira ◽  
Jason Yang ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Production Capability

A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography

1981 ◽  
Vol 28 (11) ◽  
pp. 1422-1428 ◽  
Author(s):  
I. Brodie ◽  
E.R. Westerberg ◽  
D.R. Cone ◽  
J.J. Muray ◽  
N. Williams ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Exposure System
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