Deep Traps and Mechanism of Brightness Degradation in Mn-doped ZnS Thin-Film Electroluminescent Devices Grown by Metal-Organic Chemical Vapor Deposition

1997 ◽  
Vol 36 (Part 1, No. 5A) ◽  
pp. 2728-2732 ◽  
Author(s):  
Ching-Wu Wang ◽  
Tong-Ji Sheu ◽  
Yan-Kuin Su ◽  
Meiso Yokoyama
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Electroluminescent Devices ◽  
Deep Traps ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition ◽  
Mn Doped

Modeling of hall mobility for In2O3 thin film by metal organic chemical vapor deposition

2019 ◽  
Vol 88 (1) ◽  
pp. 10301
Author(s):  
Lei Qiang ◽  
Yanli Pei ◽  
Ruohe Yao
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Hall Mobility ◽  
Vapor Deposition ◽  
Variable Temperature ◽  
Calculated Data ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

In the light of variable temperature (4.2–300 K) Hall-effect measurements a physics-based model for Hall mobility of indium oxide (In2O3), thin film processed by metal organic chemical vapor deposition (MOCVD) has been established. It illustrates the relation among Hall mobility, scattering mechanisms and carrier concentrations exhaustively. Dependence of the potential barrier between grain boundaries on the carrier concentration has been factored in. Concomitantly, account have been taken of exponential tails and the degeneracy in In2O3 film. The proposed model reassured by a comparison of the experimental and theoretical calculated data is feasible and reliable. Results demonstrate that under low carrier densities, the prevailing scattering mechanism would be grain boundary scattering, nevertheless, upon exceeding the concentration of 1019cm−3, Hall mobility is chiefly confined to scattering by ionized impurities.

Growth of β-FeSi2 Thin Film on Si (111) by Metal-Organic Chemical Vapor Deposition

2001 ◽  
Vol 40 (Part 2, No. 5A) ◽  
pp. L460-L462 ◽  
Author(s):  
Kensuke Akiyama ◽  
Seishiro Ohya ◽  
Hiromichi Takano ◽  
Nobuo Kieda ◽  
Hiroshi Funakubo
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
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