Production of Low-Electron-Temperature Electron Cyclotron Resonance Plasma Using Nitrogen Gas in the Mirror Magnetic Field

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.2489 ◽

2001 ◽

Vol 40 (Part 1, No. 4A) ◽

pp. 2489-2494 ◽

Author(s):

Naho Itagaki ◽

Yoko Ueda ◽

Nobuo Ishii ◽

Yoshinobu Kawai

Keyword(s):

Magnetic Field ◽

Electron Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Nitrogen Gas ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Electron ◽

Resonance Plasma

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Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915MHz microwave

Vacuum ◽

10.1016/s0042-207x(02)00138-0 ◽

2002 ◽

Vol 66 (3-4) ◽

pp. 323-328 ◽

Author(s):

N Itagaki ◽

S Kawakami ◽

N Ishii ◽

Y Kawai

Keyword(s):

Electron Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Electron ◽

Resonance Plasma

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Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153464 ◽

2015 ◽

Author(s):

L.C. Hu ◽

Y.W. Lin ◽

C.J. Wang ◽

T. C. Wei ◽

C.R. Yang ◽

...

Keyword(s):

Magnetic Field ◽

Plasma Diagnostics ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Field Effects ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Resonance Magnetic Field

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Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.3147 ◽

1991 ◽

Vol 30 (Part 1, No. 11B) ◽

pp. 3147-3153 ◽

Author(s):

Seiji Samukawa ◽

Tsuyoshi Nakamura

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Characteristics ◽

Resonance Plasma

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Processing Uniformity Improvement by Magnetic Field Distribution Control in Electron Cyclotron Resonance Plasma Chamber

10.7567/ssdm.1992.a-2-6 ◽

1992 ◽

Author(s):

Hiroshi Nishimura ◽

Mikiho Kiuchi ◽

Seitaro Matsuo

Keyword(s):

Magnetic Field ◽

Field Distribution ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Field Distribution ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chamber ◽

Resonance Plasma

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Electron cyclotron resonance plasma source in a flaring magnetic field

Plasma Sources Science and Technology ◽

10.1088/0963-0252/3/2/001 ◽

1994 ◽

Vol 3 (2) ◽

pp. 123-127 ◽

Author(s):

X Caron ◽

R L Meyer ◽

C Meis

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Plasma potential measurement in 2.45GHz electron cyclotron resonance plasma with a magnetron magnetic field configuration

Thin Solid Films ◽

10.1016/j.tsf.2010.03.153 ◽

2010 ◽

Vol 518 (22) ◽

pp. 6690-6693

Author(s):

Seong Bong Kim ◽

Won Namkung ◽

Moohyun Cho ◽

Dae Chul Kim ◽

Suk Jae Yoo

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Potential ◽

Field Configuration ◽

Electron Cyclotron ◽

Magnetic Field Configuration ◽

Electron Cyclotron Resonance Plasma ◽

Potential Measurement ◽

Resonance Plasma

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Electron cyclotron resonance plasma generation using a planar ring‐cusp magnetic field and a reentrant coaxial cavity

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579527 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2105-2109 ◽

Author(s):

Toshiaki Yasui ◽

Hirokazu Tahara ◽

Takao Yoshikawa

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Coaxial Cavity ◽

Plasma Generation ◽

Cusp Magnetic Field ◽

Resonance Plasma

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Low temperature electron cyclotron resonance plasma etching of GaAs, AlGaAs, and GaSb in Cl2/Ar

Applied Physics Letters ◽

10.1063/1.111827 ◽

1994 ◽

Vol 64 (13) ◽

pp. 1673-1675 ◽

Author(s):

S. J. Pearton ◽

F. Ren ◽

C. R. Abernathy

Keyword(s):

Low Temperature ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Temperature Electron ◽

Resonance Plasma

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11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing

Review of Scientific Instruments ◽

10.1063/1.2387885 ◽

2006 ◽

Vol 77 (11) ◽

pp. 113503 ◽

Author(s):

Toyohisa Asaji ◽

Yushi Kato ◽

Fuminobu Sato ◽

Toshiyuki Iida ◽

Junji Saito

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Beam ◽

Plasma Source ◽

Field Configuration ◽

Electron Cyclotron ◽

Magnetic Field Configuration ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Vertical and lateral hole aluminum filling characteristics employing electron cyclotron resonance plasma sputtering with high magnetic field

Applied Physics Letters ◽

10.1063/1.109945 ◽

1993 ◽

Vol 63 (6) ◽

pp. 737-739 ◽

Author(s):

S. Shingubara ◽

N. Morimoto ◽

S. Takehiro ◽

Y. Matsui ◽

I. Utsunomiya ◽

...

Keyword(s):

Magnetic Field ◽

High Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Filling Characteristics ◽

Resonance Plasma

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