Local Leakage Current of HfO2Thin Films Characterized by Conducting Atomic Force Microscopy

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1949-1953 ◽  
Author(s):  
Hiroya Ikeda ◽  
Tomokazu Goto ◽  
Mitsuo Sakashita ◽  
Akira Sakai ◽  
Shigeaki Zaima ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Force Microscopy ◽  
Atomic Force

Leakage current analysis for dislocations in Na-flux GaN bulk single crystals by conductive atomic force microscopy

2018 ◽  
Vol 123 (16) ◽  
pp. 161417 ◽  
Author(s):  
T. Hamachi ◽  
S. Takeuchi ◽  
T. Tohei ◽  
M. Imanishi ◽  
M. Imade ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Single Crystals ◽  
Leakage Current ◽  
Current Analysis ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Bulk Single Crystals

Local Leakage Current of HfO2 Thin Films Characterized by Conducting Atomic Force Microscopy

2002 ◽  
Author(s):  
Hiroya Ikeda ◽  
Tomokazu Goto ◽  
Mitsuo Sakashita ◽  
Akira Sakai ◽  
Shigeaki Zaima ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Force Microscopy ◽  
Atomic Force

Novel Gox Inspection Methodology in Advanced Silicon Process

2011 ◽  
Author(s):  
Kuo Yu Wang ◽  
Kuo Hsiung Chen ◽  
Jian Chang Lin ◽  
W. S. Wu
Keyword(s):  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Gate Oxide ◽  
New Method ◽  
Electrical Behavior ◽  
Inspection Method ◽  
Force Microscopy ◽  
Atomic Force

Abstract This paper describes a new gate oxide (Gox) inspection method that uses nanoprobing and capacitive-atomic force microscopy (C-AFM) along with optimized etch chemistries and polishing techniques. It presents several examples showing how the new method outperforms conventional Gox inspection approaches in its ability to locate defects such as oxide pin holes and impurities that cause leakage current. It also discusses the electrical behavior of pin holes and soft defects.

Analysis of Local Leakage Current of Pr Oxide Thin Films with Conductive Atomic Force Microscopy

2010 ◽  
Author(s):  
M. Adachi ◽  
M. Sakashita ◽  
H. Kondo ◽  
W. Takeuchi ◽  
O. Nakatsuka ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Oxide Thin Films ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force

Investigation of leakage current paths in n-GaN by conductive atomic force microscopy

2014 ◽  
Vol 104 (10) ◽  
pp. 102101 ◽  
Author(s):  
Bumho Kim ◽  
Daeyoung Moon ◽  
Kisu Joo ◽  
Sewoung Oh ◽  
Young Kuk Lee ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force

Microscopic Analysis of Stress-Induced Leakage Current in Stressed Gate SiO2Films Using Conductive Atomic Force Microscopy

2004 ◽  
Vol 43 (No. 2A) ◽  
pp. L144-L147 ◽  
Author(s):  
Yukihiko Watanabe ◽  
Akiyoshi Seko ◽  
Hiroki Kondo ◽  
Akira Sakai ◽  
Shigeaki Zaima ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Microscopic Analysis ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Stress Induced Leakage Current

Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy

2011 ◽  
Vol 50 (4S) ◽  
pp. 04DA08
Author(s):  
Masaki Adachi ◽  
Yuzo Kato ◽  
Kimihiko Kato ◽  
Mitsuo Sakashita ◽  
Hiroki Kondo ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Leakage Current ◽  
Oxide Thin Films ◽  
Conductive Atomic Force Microscopy ◽  
Force Microscopy ◽  
Atomic Force
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