Thermochemical Stability of IrO2Bottom Electrodes in Direct-Liquid-Injection Metalorganic Chemical Vapor Deposition of Pb(Zr,Ti)O3Films

2004 ◽  
Vol 43 (5A) ◽  
pp. 2655-2660 ◽  
Author(s):  
Kyung-Mun Byun ◽  
Won-Jong Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Liquid Injection ◽  
Direct Liquid Injection ◽  
Thermochemical Stability ◽  
Metalorganic Chemical

Characterization of hafnium aluminate gate dielectrics deposited by liquid injection metalorganic chemical vapor deposition

2004 ◽  
Vol 84 (20) ◽  
pp. 4119-4121 ◽  
Author(s):  
R. J. Potter ◽  
P. A. Marshall ◽  
P. R. Chalker ◽  
S. Taylor ◽  
A. C. Jones ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Gate Dielectrics ◽  
Chemical Vapor ◽  
Liquid Injection ◽  
Metalorganic Chemical

Pulsed liquid-injection metalorganic chemical vapor deposition of (La0.7Sr0.3MnO3/SrTiO3)15 superlattices

2001 ◽  
Vol 79 (9) ◽  
pp. 1246-1248 ◽  
Author(s):  
C. Dubourdieu ◽  
M. Rosina ◽  
H. Roussel ◽  
F. Weiss ◽  
J. P. Sénateur ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Liquid Injection ◽  
Metalorganic Chemical

Growth behavior on V-grooved high Miller index GaAs substrates by metalorganic chemical vapor deposition

1995 ◽  
Vol 146 (1-4) ◽  
pp. 482-488 ◽  
Author(s):  
Moo-Sung Kim ◽  
Yong Kim ◽  
Min-Suk Lee ◽  
Young Ju Park ◽  
Seong-II Kim ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Growth Behavior ◽  
Miller Index ◽  
Gaas Substrates ◽  
Metalorganic Chemical

scholarly journals Metalorganic chemical vapor deposition of InN quantum dots and nanostructures

2021 ◽  
Vol 10 (1) ◽  
Author(s):  
Caroline E. Reilly ◽  
Stacia Keller ◽  
Shuji Nakamura ◽  
Steven P. DenBaars
Keyword(s):  
Quantum Dots ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Near Infrared ◽  
Optoelectronic Devices ◽  
Chemical Vapor ◽  
Electromagnetic Spectrum ◽  
Material System ◽  
Metalorganic Chemical

AbstractUsing one material system from the near infrared into the ultraviolet is an attractive goal, and may be achieved with (In,Al,Ga)N. This III-N material system, famous for enabling blue and white solid-state lighting, has been pushing towards longer wavelengths in more recent years. With a bandgap of about 0.7 eV, InN can emit light in the near infrared, potentially overlapping with the part of the electromagnetic spectrum currently dominated by III-As and III-P technology. As has been the case in these other III–V material systems, nanostructures such as quantum dots and quantum dashes provide additional benefits towards optoelectronic devices. In the case of InN, these nanostructures have been in the development stage for some time, with more recent developments allowing for InN quantum dots and dashes to be incorporated into larger device structures. This review will detail the current state of metalorganic chemical vapor deposition of InN nanostructures, focusing on how precursor choices, crystallographic orientation, and other growth parameters affect the deposition. The optical properties of InN nanostructures will also be assessed, with an eye towards the fabrication of optoelectronic devices such as light-emitting diodes, laser diodes, and photodetectors.

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