Role of Hydrogen in Dry Etching of Silicon Carbide Using Inductively and Capacitively Coupled Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.3817 ◽

2005 ◽

Vol 44 (6A) ◽

pp. 3817-3821 ◽

Author(s):

Hidenori Mikami ◽

Tomoaki Hatayama ◽

Hiroshi Yano ◽

Yukiharu Uraoka ◽

Takashi Fuyuki

Keyword(s):

Silicon Carbide ◽

Dry Etching ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Comparison of dry etching of PMMA and polycarbonate in diffusion pump-based O2 capacitively coupled plasma and inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2010.02.053 ◽

2010 ◽

Vol 518 (22) ◽

pp. 6465-6468 ◽

Author(s):

J.H. Park ◽

S.H. Lee ◽

K.H. Choi ◽

H.S. Noh ◽

J.W. Lee ◽

...

Keyword(s):

Inductively Coupled Plasma ◽

Dry Etching ◽

Capacitively Coupled ◽

Inductively Coupled ◽

Diffusion Pump ◽

Capacitively Coupled Plasma

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Optimization of dry etching parameters for fabrication of polysilicon waveguides with smooth sidewall using a capacitively coupled plasma reactor

Applied Optics ◽

10.1364/ao.53.005745 ◽

2014 ◽

Vol 53 (25) ◽

pp. 5745 ◽

Author(s):

Surya Cheemalapati ◽

Mikhail Ladanov ◽

John Winskas ◽

Anna Pyayt

Keyword(s):

Plasma Reactor ◽

Dry Etching ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma ◽

Etching Parameters

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The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

Applied Physics Letters ◽

10.1063/1.2972117 ◽

2008 ◽

Vol 93 (8) ◽

pp. 081502 ◽

Author(s):

D. O’Connell ◽

T. Gans ◽

E. Semmler ◽

P. Awakowicz

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Frequency Coupling ◽

Capacitively Coupled Plasma

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Dust transport phenomena in a capacitively coupled plasma reactor

Journal of Applied Physics ◽

10.1063/1.1285843 ◽

2001 ◽

Vol 89 (1) ◽

pp. 34-41 ◽

Author(s):

Heon Chang Kim ◽

Vasilios I. Manousiouthakis

Keyword(s):

Plasma Reactor ◽

Transport Phenomena ◽

Capacitively Coupled ◽

Dust Transport ◽

Capacitively Coupled Plasma

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Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

Applied Physics Letters ◽

10.1063/1.127020 ◽

2000 ◽

Vol 77 (4) ◽

pp. 489-491 ◽

Author(s):

T. Kitajima ◽

Y. Takeo ◽

Z. Lj. Petrović ◽

T. Makabe

Keyword(s):

Capacitively Coupled ◽

Capacitively Coupled Plasma

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1-D Fluid Modeling of Methane Dissociation in Radiofrequency Capacitively Coupled Plasma

Renewable Energy for Smart and Sustainable Cities - Lecture Notes in Networks and Systems ◽

10.1007/978-3-030-04789-4_55 ◽

2018 ◽

pp. 516-522

Author(s):

Abdelatif Gadoum ◽

Djilali Benyoucef ◽

Mohamed Habib Allah Lahoual

Keyword(s):

Capacitively Coupled ◽

Fluid Modeling ◽

Capacitively Coupled Plasma ◽

Methane Dissociation

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Simulation of cold plasma in a chamber under high- and low-frequency voltage conditions for a capacitively coupled plasma

Journal of Semiconductors ◽

10.1088/1674-4926/33/10/104004 ◽

2012 ◽

Vol 33 (10) ◽

pp. 104004 ◽

Author(s):

Daoxin Hao ◽

Jia Cheng ◽

Linhong Ji ◽

Yuchun Sun

Keyword(s):

Cold Plasma ◽

Low Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Prediction of a Radial Variation of Plasma Structure and Ion Distributions in the Wafer Interface in Two-Frequency Capacitively Coupled Plasma

IEEE Transactions on Plasma Science ◽

10.1109/tps.2004.823968 ◽

2004 ◽

Vol 32 (1) ◽

pp. 90-100 ◽

Author(s):

T. Yagisawa ◽

K. Maeshige ◽

T. Shimada ◽

T. Makabe

Keyword(s):

Radial Variation ◽

Plasma Structure ◽

Capacitively Coupled ◽

Ion Distributions ◽

Capacitively Coupled Plasma

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Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

Plasma Science and Technology ◽

10.1088/1009-0630/18/2/08 ◽

2016 ◽

Vol 18 (2) ◽

pp. 143-146

Author(s):

Hongyu Wang ◽

Wei Jiang ◽

Peng Sun ◽

Shuangyun Zhao ◽

Yang Li

Keyword(s):

Dual Frequency ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Atmospheric pressure, radio frequency, parallel plate capacitively coupled plasma—excitation temperatures and analytical figures of merit

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(97)00080-3 ◽

1997 ◽

Vol 52 (13) ◽

pp. 1983-1993 ◽

Author(s):

M.M. Rahman ◽

M.W. Blades

Keyword(s):

Radio Frequency ◽

Atmospheric Pressure ◽

Parallel Plate ◽

Capacitively Coupled ◽

Figures Of Merit ◽

Plasma Excitation ◽

Capacitively Coupled Plasma ◽

Analytical Figures Of Merit

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