Mask Critical Dimension Specification Considering Process Sensitivity of Mask Error in Extreme Ultraviolet Lithography
Impact of Slanted Absorber Side Walls on Critical Dimension Error in Extreme Ultraviolet Lithography
2007 ◽
Vol 46
(1)
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pp. 84-90
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2000 ◽
Vol 18
(6)
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pp. 2921
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2011 ◽
Vol 50
(6)
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pp. 06GB07
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2019 ◽
Vol 18
(02)
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pp. 1
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2016 ◽
Vol 15
(4)
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pp. 044001
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2013 ◽
Vol 12
(2)
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pp. 021006
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2014 ◽
Vol 14
(3)
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pp. 2630-2634