Full Field Analysis of Critical Dimension Uniformity Due to Focal Variation for Contact Features in Extreme Ultraviolet Lithography

2014 ◽  
Vol 14 (3) ◽  
pp. 2630-2634
Author(s):  
Hung-Fei Kuo ◽  
. Frederick
Keyword(s):  
Extreme Ultraviolet ◽  
Critical Dimension ◽  
Field Analysis ◽  
Extreme Ultraviolet Lithography ◽  
Full Field ◽  
Ultraviolet Lithography

Multiscale Simulation for Exploring Photo-Chemical Processes to Mitigate the Critical Dimension Variability of Contact Hole in EUV Lithography

2021 ◽  
Author(s):  
Sungwoo Park ◽  
Hyungwoo Lee ◽  
Muyoung Kim ◽  
Taegyeom Kim ◽  
Byunghoon Lee ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Extreme Ultraviolet ◽  
Critical Dimension ◽  
Multiscale Simulation ◽  
Chemical Processes ◽  
Production Yield ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Patterned Surface ◽  
Euv Lithography

In extreme ultraviolet lithography (EUVL), non-uniformity of patterned surface roughness of contact holes results in pattern failures such as bridging- or missing holes, which affect production yield. In this study,...

Mask Critical Dimension Specification Considering Process Sensitivity of Mask Error in Extreme Ultraviolet Lithography

2007 ◽  
Vol 46 (9B) ◽  
pp. 6145-6149
Author(s):  
Sungmin Huh ◽  
Hoon Kim ◽  
Ilyong Jang ◽  
Sung-Yong Cho ◽  
Dongwan Kim ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Critical Dimension ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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