Fabrication of Highly Scaled Silicon Nanowire Gate-All-Around Metal–Oxide–Semiconductor Field Effect Transistors by Using Self-Aligned Local-Channel V-gate by Optical Lithography Process
2010 ◽
Vol 49
(8)
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pp. 084203
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2014 ◽
Vol 14
(11)
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pp. 8219-8224
2010 ◽
Vol 49
(4)
◽
pp. 04DN03
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2015 ◽
Vol 87
(19)
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pp. 9982-9990
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Keyword(s):
2012 ◽
Vol 51
(2)
◽
pp. 02BC06
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Keyword(s):
2020 ◽
Vol 59
(SG)
◽
pp. SGGA02
◽
2008 ◽
Vol 47
(4)
◽
pp. 3277-3281
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Keyword(s):