Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: Process fundamentals

B. S. Meyerson

doi:10.1147/rd.346.0806

Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: Process fundamentals

IBM Journal of Research and Development ◽

10.1147/rd.346.0806 ◽

1990 ◽

Vol 34 (6) ◽

pp. 806-815 ◽

Cited By ~ 47

Author(s):

B. S. Meyerson

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

Low-temperature Si and Si: Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: process fundamentals

Microelectronics Reliability ◽

10.1016/0026-2714(92)90586-a ◽

1992 ◽

Vol 32 (4) ◽

pp. 595

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

Low-temperature Si and Si:Ge epitaxy by ultrahigh vacuum/chemical vapor deposition: Process fundamentals

IBM Journal of Research and Development ◽

10.1147/rd.441.0132 ◽

2000 ◽

Vol 44 (1.2) ◽

pp. 132-141 ◽

Cited By ~ 4

Author(s):

B. S. Meyerson

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

Low Temperature Growth of Graphene on Glass by Carbon-Enclosed Chemical Vapor Deposition Process and Its Application as Transparent Electrode

Chemistry of Materials ◽

10.1021/cm504431d ◽

2015 ◽

Vol 27 (5) ◽

pp. 1646-1655 ◽

Cited By ~ 30

Author(s):

Yu-Ze Chen ◽

Henry Medina ◽

Hung-Wei Tsai ◽

Yi-Chung Wang ◽

Yu-Ting Yen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Transparent Electrode ◽

Chemical Vapor Deposition Process ◽

Temperature Growth ◽

Low Temperature Growth ◽

Vapor Deposition Process

Development of a low-temperature GaN chemical vapor deposition process based on a single molecular source H2GaN3

Applied Physics Letters ◽

10.1063/1.123398 ◽

1999 ◽

Vol 74 (6) ◽

pp. 883-885 ◽

Cited By ~ 28

Author(s):

Jeff McMurran ◽

J. Kouvetakis ◽

David J. Smith

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Molecular Source ◽

Vapor Deposition Process

A low temperature () chemical vapor deposition process for the deposition of device-quality epitaxial silicon

Materials Science and Engineering B ◽

10.1016/0921-5107(88)90035-9 ◽

1988 ◽

Vol 1 (1) ◽

pp. 131-134 ◽

Cited By ~ 1

Author(s):

W.R. Burger ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Epitaxial Silicon ◽

Vapor Deposition Process

Microcrystalline/Amorphous Thin Si Films Deposition by a Newly Developed Dual Injection System Employing Hydrogen Plasma and Silicon Radicals at Low Temperature (300 °C) Chemical Vapor Deposition Process

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.2542 ◽

2007 ◽

Vol 46 (4B) ◽

pp. 2542-2553 ◽

Cited By ~ 5

Author(s):

Toru Takeda ◽

Kouji Tanaka ◽

Hirotada Inoue ◽

Masaki Hirayama ◽

Toshirou Tsumori ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Injection System ◽

Si Films ◽

Vapor Deposition Process

ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

An analysis of the effect of the solid layer for the modified chemical vapor deposition process

Wärme- und Stoffübertragung ◽

10.1007/bf01541187 ◽

1993 ◽

Vol 28 (4) ◽

pp. 169-176 ◽

Cited By ~ 5

Author(s):

Y. T. Lin ◽

M. Choi ◽

R. Greif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Solid Layer ◽

Vapor Deposition Process

The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition

Aerosol Science and Technology ◽

10.1080/02786828808959211 ◽

1988 ◽

Vol 9 (3) ◽

pp. 237-249 ◽

Cited By ~ 18

Author(s):

M. Fiebig ◽

M. Hilgenstock ◽

H.-A. Riemann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Chemical Vapor Deposition Process ◽

Concentric Annulus ◽

Vapor Deposition Process

In Situ Monitoring of the Products from the SiH4 + WF 6 Tungsten Chemical Vapor Deposition Process by Micro‐Volume Mass Spectrometry

Journal of The Electrochemical Society ◽

10.1149/1.2221130 ◽

1993 ◽

Vol 140 (12) ◽

pp. 3588-3590 ◽

Cited By ~ 8

Author(s):

Roger W. Cheek ◽

Jeffry A. Kelber ◽

James G. Fleming ◽

Robert S. Blewer ◽

Richard D. Lujan

Keyword(s):

Mass Spectrometry ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

In Situ Monitoring ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process