Gas‐Phase Reaction Study of Disilane Pyrolysis: Applications to Low Pressure Chemical Vapor Deposition

1994 ◽  
Vol 141 (8) ◽  
pp. 2135-2140 ◽  
Author(s):  
Justine E. Johannes ◽  
John G. Ekerdt
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Phase Reaction ◽  
Gas Phase Reaction ◽  
Reaction Study ◽  
Pressure Chemical

Homogeneous Gas Phase Nucleation of Silane in Low Pressure Chemical Vapor Deposition (LPCVD)

1988 ◽  
Vol 135 (9) ◽  
pp. 2378-2379 ◽  
Author(s):  
Z. M. Qian ◽  
H. Michiel ◽  
A. Van Ammel ◽  
J. Nijs ◽  
R. Mertens
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Phase Nucleation

Modeling of the elementary gas‐phase reaction during chemical vapor deposition of silicon carbide from CH 3 SiCl 3 /H 2

2020 ◽  
Vol 52 (6) ◽  
pp. 359-367
Author(s):  
Noboru Sato ◽  
Yuichi Funato ◽  
Yasuyuki Fukushima ◽  
Takeshi Momose ◽  
Mitsuo Koshi ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Phase Reaction ◽  
Gas Phase Reaction
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