Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Silicon Wafer

2017 ◽  
Vol 38 (6) ◽  
pp. 469-476
Author(s):  
Si Hwan Kim ◽  
Byung Chan Yang ◽  
Jihwan An ◽  
Hyo Sok Ahn
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Silicon Wafer ◽  
Atomic Layer ◽  
Deposition Method ◽  
Zro2 Thin Film ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method ◽  
Scratch Behavior

Vertical Channel ZnO Thin-Film Transistors Using an Atomic Layer Deposition Method

2014 ◽  
Vol 35 (3) ◽  
pp. 360-362 ◽  
Author(s):  
Chi-Sun Hwang ◽  
Sang-Hee Ko Park ◽  
Himchan Oh ◽  
Min-Ki Ryu ◽  
Kyoung-Ik Cho ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Thin Film Transistors ◽  
Vertical Channel ◽  
Atomic Layer ◽  
Zno Thin Film ◽  
Deposition Method ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

Study on the characteristics of TiAlN thin film deposited by atomic layer deposition method

2001 ◽  
Vol 19 (6) ◽  
pp. 2831 ◽  
Author(s):  
Jaehyoung Koo ◽  
June-Woo Lee ◽  
Taehan Doh ◽  
Yangdo Kim ◽  
Young-Do Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method
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