Monte Carlo Based Weibull Lifetime Uncertainty Calculations and Statistical Comparison of Semiconductor Manufacturing Process Module Changes for Lifetime Improvement

2019 ◽  
Vol 13 (2) ◽  
pp. 393-402
Author(s):  
Jagdish Prasad ◽  
Bruce Greenwood
Author(s):  
Anqi Qiu ◽  
William Lowe ◽  
Mridul Arora

Abstract Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.


RSC Advances ◽  
2015 ◽  
Vol 5 (126) ◽  
pp. 103901-103906 ◽  
Author(s):  
Fuyun He ◽  
Zhisheng Zhang

In semiconductor manufacturing, the multilayer overlay lithography process is a typical multistage manufacturing process; one of the key factors that restrict the reliability and yield of integrated circuit chips is overlay error between the layers.


2010 ◽  
Vol 126-128 ◽  
pp. 867-872
Author(s):  
Jian Long Kuo ◽  
Chun Cheng Kuo

Since the solder residue is essential in the semiconductor manufacturing process, it has great impact on the flip chip quality considerably. This paper intends to improve the flip chip quality and try to obtain an optimal solution for the system parameters in the flip chip manufacturing process. The SMT manufacturing process is studied for discussion. The amount of solder and the size of solder are selected as the two quality properties. During the flux cleaning process, many solders are left on the passive component side. The balling might flow into the chip. It will cause the bump short in the chip which will affect the quality of the flip chip severely. In this paper, response surface method is adopted as the design of experiments. The objective function and subjective constrained conditions are defined to formulate the optimization problem. The confirmation experimental results are also provided to prove the validity. It is believed that the optimization results are helpful to the improvement of the semiconductor manufacturing process.


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