Formation of Silicon Nitride Layer on Microcrystalline Silicon Thin Films by Hot-wire Chemical Vapor Method using Nitrogen and Hydrogen Gases

2019 ◽  
Vol 25 (8) ◽  
pp. 339-342
Author(s):  
Akimori Tabata ◽  
Koji Mazaki ◽  
Akihiro Kondo
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Chemical Vapor ◽  
Nitride Layer ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films ◽  
Silicon Nitride Layer ◽  
Vapor Method

Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

2000 ◽  
Vol 360 (1-2) ◽  
pp. 205-212 ◽  
Author(s):  
M. Zhu ◽  
X. Guo ◽  
G. Chen ◽  
H. Han ◽  
M. He ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films

Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

2009 ◽  
Vol 517 (10) ◽  
pp. 3039-3042 ◽  
Author(s):  
R.E.I. Schropp ◽  
C.H.M. van der Werf ◽  
V. Verlaan ◽  
J.K. Rath ◽  
H. Li
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Semiconductor Silicon ◽  
Silicon Thin Films

Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

2006 ◽  
Vol 501 (1-2) ◽  
pp. 133-136 ◽  
Author(s):  
Jean-Eric Bourée ◽  
Sandesh R. Jadkar ◽  
Samir Kasouit ◽  
Régis Vanderhaghen
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films

N2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature

2011 ◽  
Vol 519 (14) ◽  
pp. 4535-4537 ◽  
Author(s):  
Yuhei Omori ◽  
Akimori Tabata ◽  
Akihiro Kondo
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Wire Temperature ◽  
Silicon Thin Films ◽  
Post Deposition ◽  
Vapor Method

Effect of the Structural Change of Hydrogenated Microcrystalline Silicon Thin Films Prepared by Hot-Wire Chemical Vapor Deposition

2006 ◽  
Vol 45 (7) ◽  
pp. 5671-5674 ◽  
Author(s):  
Shuichi Hiza ◽  
Wataru Matsuda ◽  
Akira Yamada ◽  
Makoto Konagai
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Structural Change ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films
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