Liquid Injection Atomic Layer Deposition of Metallic Ru Thin Films from
Ru(tmhd)3 and of High-k TiO2 Thin Films from Ti(O-i-Pr)2(tmhd)2
Keyword(s):
High K
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2007 ◽
Vol 50
(6)
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pp. 1827
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2015 ◽
Vol 33
(1)
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pp. 01A140
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2008 ◽
Vol 354
(2-9)
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pp. 404-408
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2009 ◽
Vol 91
(3-4)
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pp. 628-633
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