Preparation of Polymer Particles Coated with a Diamond-like Carbon Film by a Polygonal Barrel-Plasma Chemical Vapor Deposition Method

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Deposition Method ◽

Polymer Particles ◽

Plasma Chemical ◽

Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Cited By ~ 9

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Cited By ~ 12

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

10.7567/jjap.56.06gn01 ◽

2017 ◽

Vol 56 (6S1) ◽

pp. 06GN01 ◽

Cited By ~ 2

Author(s):

Wenlei Zhang ◽

Akio Uesugi ◽

Yoshikazu Hirai ◽

Toshiyuki Tsuchiya ◽

Osamu Tabata

Keyword(s):

Tensile Test ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Diamond Like Carbon ◽

Deposition Method ◽

Diamond Like Carbon Film

Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00475-1 ◽

2001 ◽

Vol 10 (2) ◽

pp. 248-253 ◽

Cited By ~ 19

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Choong Hun Lee ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Field Emission Display ◽

Plasma Chemical ◽

Preparation of PbTiO3 films by sputter assisted plasma chemical vapor deposition method.

Shinku ◽

10.3131/jvsj.32.341 ◽

1989 ◽

Vol 32 (3) ◽

pp. 341-344

Author(s):

Shoichi MOCHIZUKI ◽

Saburo KIMURA ◽

Tadashi ISHIDA ◽

Ryoji MAKABE

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma